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Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System

Type:	Coating Production Line
Coating:	Vacuum Coating
Certification:	CE
Condition:	New
Wafer Dimension:	8 Inch and Below
Wafer Temperature:	Rt-400c,Controlling Precision +-0.1c

Customization:	Available \| Customized Request

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