Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System

Type: Coating Production Line
Coating: Vacuum Coating
Certification: CE
Condition: New
Wafer Dimension: 8 Inch and Below
Wafer Temperature: Rt-400c,Controlling Precision +-0.1c
Customization:
Diamond Member Since 2016

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Basic Info.

Number of Precursor
Three Precursor Lines, Optional More Lines
Temperature of Precursor Lines
Rt-200c,Controlling Precision +-0.1c
Ald Valve
Swagelok Ald Swift Valve
Background Vacuum
<5*10-3torr
Gas Carrier System
N2 or Ar
Transport Package
Standard Export Wooden Box Packaging
Trademark
CYKY
Origin
Zhengzhou Henan China
HS Code
8412800090
Production Capacity
200 Sets Per Month

Product Description

Heating (T-ALD) atomic layer deposition system TALD Thermal Atomic Layer Deposition System


Introduction of TALD atomic layer deposition system:
Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization .The electric of the system completely accords with the CE criterion. , it's widely used in the fields of micro-electronic,nano material, optical film, solar battery etc.

Product benefit
Advanced software controlling system: many functions are integrated in the system,including technological formulation, parameter setting, popedom stetting ,interlocking alarming ad state supervisory control.

ALD Films
Elementary substance: Co, Cu, Ta, Ti, W, Ge, Pt, Ru, Ni, Fe…
Nitride: TiN, SiN, AlN, TaN, ZrN, HfN, WN …
Oxide: TiO2, HfO2, SiO2, ZnO, ZrO2, Al2O3, La2O3, SnO2
Others: GaAs, AlP, InP, GaP, InAs, LaHfxOy, SrTiO3,SrTaO6

Application fields of ALD
High-k gate oxides
Storage capacitor dielectrics
High aspect ratio diffusion barriers for Cu interconnects
Pinhole-free passivation layers for OLEDs and polymers
Highly conformal coatings for MEMS applications
Coating of nanoporous structures
Doping of special fiber
Solar battery
Flat plate display
Optical thin-film
Nano film of other special structure

Technical parameters of TALD atomic layer deposition system:
Wafer Dimension                    8 inch and below
Wafer temperature   RT-400ºC,Controlling precision ±0.1ºC
Number of precursor   Three precursor lines,optional more lines
Temperature of precursor lines   RT-200ºC,Controlling precision ±0.1ºC
Temperature of source bottles   RT-200ºC,Controlling precision ±0.1ºC
ALD Valve   Swagelok ALD swift valve
Background vacuum   <5*10-3Torr
Gas carrier system   N2 or Ar
Growing mode   Consecutive or interval deposition mode
Controlling system   PLC plus touch screen or display
Power supply   50-60Hz,220V/20A AC
Depositon Heterogeneity   Heterogeneity<±1%
Dimension of the instrument   600mmx600mmx1100mm

Related photos of TALD atomic layer deposition system:
Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System


Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System

Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.

Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System
Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition SystemHeating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System

Q. Are you a manufacturer or a trading company?

A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?

A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?

A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?

A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?

A.T / T, L / C, D / P, etc., it is recommended to use Alibaba Trade Guarantee.

Q. How is the package of goods? Delivery methods?

A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service.

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