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Single Chamber Type Atomic Layer Deposition System (ALD) for The Preparation of Conventional Oxide Films

Type:	Coating Production Line
Coating:	Vacuum Coating
Certification:	CE
Condition:	New
Sample Table Size:	4-12 Inches
Substrate Heating Temperature:	Rt-400 Oc; ±1 Oc

Customization:	Available \| Customized Request

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