Compact Slidable Pecvd Tube Furnace System

• After-sales Service: Online Support
• Warranty: 1 Year
• Type: Pecvd Tube Furnace
• Certification: CE, ISO
• Structure: Horizontal Type
• Brand: Cyky
• Model NO.: CY-O1200-50IC-
• Max. Temperature: 1200c
• Working Temperature: 1100c
• Transport Package: Wooden Case
• Specification: 1200C
• Trademark: CYKY
• Origin: China
• HS Code: 85141090
• Production Capacity: 500 Sets Per Year

Product Description

Compact Slidable PECVD Tube Furnace syetm with RTP tube furnace
 

Product Description

Chemical vapor deposition adopts plasma enhanced chemical vapor deposition technology, which can use high-energy plasma to promote the reaction process, effectively increase the reaction speed and reduce the reaction temperature.

It is suitable for depositing thin films of silicon nitride, amorphous silicon and microcrystalline silicon on different substrates such as optical glass, silicon, quartz and stainless steel. It has good film-forming quality, less pinholes and is not easy to crack. It is suitable for the preparation of amorphous silicon and microcrystalline silicon thin film solar cell devices. It can be widely used in the scientific research and small batch preparation of thin film materials in Colleges and universities and scientific research institutes.

 

Product Parameters

 

RF   power supply	Signal   frequency	13.56MHz
	Power   output range	0~500W
	Maximum   reflected power	100W
	Reflected   power (at maximum power)	<5W
	Power   stability	±0.1%
Working   Chamber	Heating   temperature	RT-1000ºC
	Temperature   control accuracy	±1ºC
	Sample   holder	Φ200mm
	Rotating   speed of sample holder	1-20rpm   adjustable
	Spray   head size	Φ90mm
	Distance	The   distance between the spray head and the sample is 40-100mm continuously   adjustable
	Working   vacuum for deposition	0.   133- 133Pa (can be adjusted according to the technical process)
	Flange	The   top flange can be lifted by the motor, the substrate is easy to change, and   there is a visual window
	Chamber	Stainless   steel material, Φ500mm * 500mm
	Observation   window	Φ100mm,   with baffle
Gas   supply system	Channel   numbers	6
	Measuring   unit	Mass   flow controller
	Measuring   range	A   channel: 0~200SCCM   for H2	Remarks:   If other ranges are required, please specify when ordering. According to the   customer's specific requirements, the flow meter of corresponding gas type   and range is optional.
		B   channel: 0~200SCCM   for CH4
		C   channel: 0~200SCCM   for C2H4
		C   channel: 0~500SCCM   for N2
		D   channel: 0~500SCCM   for NH3
		E   channel: 0~500SCCM   for Ar
	Measurement accuracy	±1.5%F.S
	Working   pressure difference	-0.15Mpa~0.15Mpa
	Connecting   pipe	304   stainless steel
	Gas   channel	304   stainless steel needle valve
	Interface   specification	1/4"   ferrule connector for gas inlet and outlet
Vacuum   system	Backing   pump	4.7L/s
	Molecular   pump	1200L/s
	Vacuum   measurement	Compound   vacuum gauge, range 10^-5Pa ~ 10^5Pa
	Vacuum   degree	5.0*10^-3Pa
Water   chiller	Cooling   water temperature	<=37ºC
	Water   flow	10L/min
	Power	0.1KW
	Cooling   power	50W/ºC
Power   supply		AC220V   50Hz

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