| Customization: | Available |
|---|---|
| Application: | Industry, School, Lab |
| Customized: | Customized |
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| Input Power | Single phase 220 VAC, 50 / 60Hz 700 W (including vacuum pump) For using 110V AC, we will include a transformer for you. Please select the voltage in the Product Options |
| Output Power | 1600 VDC 40 mA max |
| Vacuum Chamber | Vacuum chamber: 150 mm ID x 150 mm H, made of high purity quartz Sealing flange made of stainless steel with flat O-ring |
| Sample Stage with Heater | Stage size: 50 mm Dia. Sputtering distance range: 25 - 40 mm adjustable Rotatable stage with three sputtering positions (controlled by the touch screen) Substrate heater is built-in with a maximum heating temperature of 500 °C PID temperature controller with +/- 1 °C accuracy is integrated to the touch screen |
| Control Panel |
6" color touch screen with PLC integration for easy operation Vacuum gauge, sputtering current meter, and substrate temperature control are integrated to the touch screen panel Adjustment knobs on the front panel for gas intake and sputtering current control Sputtering position, sputtering timer, and process logging are accessible from the touch screen |
| Shield | Stainless steel shield cage is included for extra protection |
| Sputtering Targets |
Target size requirements: 47 mm Dia. x 2.5 mm max Three targets are included in standard package for immediate use: Au target, 47 mm Dia. x 0.12 mm Ag target, 47 mm Dia. x 0.5 mm Cu target, 47 mm Dia. x 2.5 mm |
| Vacuum Pump (Optional) |
Built-in KF25 vacuum port for connecting to a vacuum pump Vacuum pump with KF25 connector is required, but not included. User may choose A double stage mechanical vacuum pump for vacuum up to 10^-2 Torr Or a turbo pump for vacuum up to 10^-4 Torr Vacuum pump can be plugged in the power outlet on the left of coater for automatic control |
| Dimensions | 440 mm L × 330 mm W × 455 mm H |
| Net Weight | 50 kg |
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