Henan, China
Business Type:
Manufacturer/Factory & Trading Company
Business Range:
Chemicals, Electrical & Electronics, Health & Medicine, Industrial Equipment & Components, ...
Main Markets:
North America, South America, Europe, Southeast Asia/ Mideast, Africa, East Asia(Japan/ ...
Terms of Payment:
LC, T/T, D/P, Western Union
OEM/ODM Service

Mini Magnetron Sputtering System, Desktop Magnetron Sputtering Machine, Magnetron Sputtering Source manufacturer / supplier in China, offering Mini Compact Desktop Magnetron Plasma Sputtering Coater, New Design Desktop Large Automatic Vacuum Spin Coater, Dual Function Soft Metal Sintering Furnace for Zirconia Blocks and Alloy Disc and so on.

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Supplier Homepage Products Film Coating Mini Compact Desktop Magnetron Plasma Sputtering Coater

Mini Compact Desktop Magnetron Plasma Sputtering Coater

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Min. Order / Reference FOB Price
1 Piece US $5,100/ Piece
Port: Zhengzhou, China
Production Capacity: 210 Sets Per Month
Payment Terms: L/C, T/T, Western Union
Type: Coating Spray Gun
Coating: Vacuum Coating
Substrate: Ceramic
Certification: CE, TUV
Condition: New
Vacuum Chamber: High Purity Fused Glass

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Basic Info

Model NO.: CY-1100X-SPC-12
Sample Stage: Dia.40mm
Control Panel: Touch Screen Panel
Warranty: One Year
Trademark: CY
Transport Package: Wooden Box
Specification: dia. 40mm
Origin: Zhengzhou
HS Code: 8543709990

Product Description

Mini Plasma Sputtering Coater with Vacuum Pump & Gold Target, 1.5" Max Sample - CY-1100X-SPC12-LD
 
CY-1100X-SPC12-LD is a compact plasma sputtering coater designed for making metallic coatings, such as gold, platinum, Indium and silver etc. Especially for coating conductive gold film for SEM sample. The plasma sputtering coater is shipped with all necessary accessories for immediate use, including one sputtering head with gold sputtering target (gold cathode), vacuum pump, stainless steel bellows and quick clamps.
 
Input Power
 
Single phase 208 - 240 VAC, 50 / 60 Hz
< 1000 W (including vacuum pump)
Vacuum Chamber

 
Vacuum chamber: 100 mm ID x 130 mm H, made of fused glass
Sealing flange made of stainless
Needle valve on front panel for gas flow control
Sample Stage
 
Stage size: 40 mm Dia.
Sputtering distance range: 15 - 80 mm adjustable
Control PanelVacuum gauge and sputtering current meter for monitoring deposition
Needle valve on front panel for gas flow control
Sputtering timer: 0 - 110 s adjustable
Vacuum Pump



 
The followings are included: 
156 L/m Double Stage Rotary Vane Vacuum Pump with vapor trap (Max vacuum 10^-2 Torr)
Stainless steel bellows with KF16 adapter and quick clamps
Two Stage Exhaust Filter on vacuum pump to eliminate oil vapor contamination
One High purity Au target (57 mm Dia. x 0.12 mm, 4N purity)
Optional: you may use a turbo pump to achieve 10^-4 Torr vacuum by a turbo pump
Sputtering TargetsTarget size requirements: 57 mm Dia. x 0.5 mm max
4N purity gold foil: 57 mm Dia. x 0.12 mm (Included and pre-installed on coater) 
Optional Targets are available 
Au target (57 mm Dia. x 0.12 mm, 4N purity) 
Pt target (57 mm Dia. x 0.12 mm, 4N purity)  
Ag target (57 mm Dia. x 0.5 mm, 4N purity)  
Size480 mm L x 320 mm W x 280 mm H       
Net Weight20 kg
Shipping Weight55 kg (120 lbs) with 1020 mm x 790 mm x 560 mm (40" x 31" x 22")
ComplianceCE approval

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