• DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
  • DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

Type: Coating Spray Gun
Coating: Vacuum Coating
Substrate: Glass
Certification: CE, TUV
Condition: New
Magnetron Sputtering Head: 2 Inch
Customization:
Diamond Member Since 2016

Suppliers with verified business licenses

Manufacturer/Factory & Trading Company

Basic Info.

Model NO.
CY-VTC-600-2HD
Vacuum Chamber
Stainless Steel
Sample Holder
Rotatable
Gas Flow Control
Precision
Warranty
One Year
Transport Package
Wooden Box
Specification
dia. 140mm
Trademark
CY
Origin
Zhengzhou, China
HS Code
8543709990
Production Capacity
210 Sets Per Month

Product Description

DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
Brief introduction
VTC-600-2HD is a compact magnetron sputtering system with dual 2" target sources, e.g., one DC source and another RF source.A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. at low cost.  
Specification 

 
Input Power 220VAC 50/60Hz, single phase  2000W (including pump)
Source Power Two sputtering power sources are integrated into one control box
DC source: 500W for coating metallic materials
RF source: 600W with auto matching for coating non-metallic materials
Magnetron Sputtering Head Two 2" Magnetron Sputtering Heads are included
One is connected to RF power supply for no-conductive materials
Another is connected to DC power source for metallic materials
Target size requirement: 2" diameter
Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets
Head Water Cooling: 10ml/min water flow required
Vacuum
Chamber
Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel
Observation Window: 100 mm diameter
Hinged type cover on top with air spring sport
Sample Holder Sample holder size: 140mm dia. for. 4" wafer max 
Sample holder rotation speed is adjustable: 1 - 20 rpm
The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow
Control
Two precision digital MFC (mass flow controller) are installed
Vacuum Pump
Station
High speed turbo vacuum pump system
Thickness
Monitor
One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å

DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater
DC/RF Dual-Head High Vacuum Magnetron Plasma Sputtering Coater



 

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now