| Customization: | Available |
|---|---|
| Type: | Coating Spray Gun |
| Coating: | Vacuum Coating |
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| Input Power | 220VAC 50/60Hz, single phase 2000W (including pump) |
| Source Power | Two sputtering power sources are integrated into one control box DC source: 500W for coating metallic materials RF source: 600W with auto matching for coating non-metallic materials |
| Magnetron Sputtering Head | Two 2" Magnetron Sputtering Heads are included One is connected to RF power supply for no-conductive materials Another is connected to DC power source for metallic materials Target size requirement: 2" diameter Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets Head Water Cooling: 10ml/min water flow required |
| Vacuum Chamber |
Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel Observation Window: 100 mm diameter Hinged type cover on top with air spring sport |
| Sample Holder | Sample holder size: 140mm dia. for. 4" wafer max Sample holder rotation speed is adjustable: 1 - 20 rpm The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C |
| Gas Flow Control |
Two precision digital MFC (mass flow controller) are installed |
| Vacuum Pump Station |
High speed turbo vacuum pump system |
| Thickness Monitor |
One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å |
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