After-sales Service: | Video Support |
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Warranty: | 12months |
Customized: | Customized |
Structure: | Desktop |
Material: | Alloy |
Certification: | CE |
Customization: |
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Lab single target plasma sputtering coating machine/ mini Single target coater
Application of single target plasma sputtering coater
CY-SPC-1100X-12 is a mini plasma sputtering system featuring one target sources:
DC source for coating metallic
Features of plasma sputtering coater
1.Hinged type cover on top with air spring sport makes target exchange easy
2.Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in
3.touch screen control panel
4.Made in Germany high speed turbo vacuum pump system
Technical of plasma sputtering coater
Input Power |
1.220VAC 50/60Hz, single phase 2.2000W (including pump) |
Source Power
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1.One sputtering power sources |
2. DC source: 500W for coating metallic materials |
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Target
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1.Target size requirement: 2" diameter |
2.Thickness Range: 0.1 - 3 mm for metallic targets(Like Ag, Ag, Cu) |
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3.Customized coater: Two DC head without, RF sputtering, RF head without DC sputering,3 RF head are available upon request |
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Vacuum Chamber |
1.Vacuum Chamber: 160 mm Dia x 120 mm height, made of quartz |
Sample Holder
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1.Sample holder size: 60mm diameter |
2.Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating(optional) |
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3.The holder temperature is adjustable from RT to 500°C Max with accuracy ± 1°C(optional) |
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Gas Flow Control
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1.Flow rate: 200 ml/min max. |
2.Flow rate is adjustable on the touch screen control panel |
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Vacuum Pump |
1.mechanical vacuum pump with 1.1L/s speed |
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2.oilless vacuum pump with 1L/s speed |
Thickness Monitor |
1.One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å |
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2.LED Display Unit outside chamber |
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3.Input material to be coated according to data base included |
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4.Display total thickness coated and coating speed |
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5.5 pcs quartz sensors (consumable) are included |
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6.Water cooling is required |
Overall Dimensions |
L400mm× W400mm× H400mm |
Application Note
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In order to remove oxygen from the chamber, suggest you use 5% Hytrogen + 95 % Nitrogen to clean chamber 2-3 times, which can reduce oxygen to below 10 ppm |
Please use > 5N purity Argon gas for plasma sputtering. Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O |
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Net Weight |
40 kg |
Warranty |
One year limited warranty with lifetime technical support |
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