Customization: | Available |
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Type: | Ceramic Heating Equipment |
Certification: | CE, TUV |
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Control Panel | All parameters of Vapor , ALD, and Gas flow are controlled by PLC via a 6" touch screen panel in a mobile cart Two Channel ALD valve For channels MFC gas delivery |
ALD valve |
Two ALD valves with pulse controller (min 10 ms duration ) Capable of heating with thermal actuators |
Liquid-Vapor Generator | Automatic liquid vapor generator is included and connect to ALD valve |
Dual Zone Split Tube furnace |
Max 1100ºC for continuous heating Two programmable precision digital temperature controllers with 30 segments. Two separate controlled Heating Zones 200mm length for each heating zone 400mm total in heating length 250mm constant central temperature heating area if both zones were heated at the same temperature 500ºC max temperature difference between two zones with thermal blocks in between Input power: 208 - 240V AC input, single phase at max. 4KW Optional: ALD control system can be installed with a short tube furnace as picture belo |
Anti-corrosive Pressure Gauge | 3.8x10-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection Fast atmospheric detection eliminates waiting time and shortens process cycle Easy to exchange plug & play sensor element |
Vacuum Pump ( optional) |
10E-2 Torr vacuum can be achieved inside processing tube Vacuum pump is not included ,suggest you order a dry pump for CVD process |
More Bubbler Optional |
bubbler or evaporator for CVD, and below right for Constant temperature control module Could add Quartz Crystal and thermocouple to monitoring thin film thickness and temperature at extra cost |
Update Idea | You may use ALD Device to build hybrid Plasma enhanced ALD+ CVD and ALD+PVD+CVD system to grow complex materials |
Warranty | One year limited warranty with lifetime support |