• 1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
  • 1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
  • 1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
  • 1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
  • 1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
  • 1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating

1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating

After-sales Service: Online Video
Warranty: 1 Year
Application: Industry, School, Lab
Customized: Customized
Certification: CE
Structure: Desktop
Customization:
Diamond Member Since 2016

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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
Overview

Basic Info.

Model NO.
CY-RTP1000-300-T
Material
Stainless Steel
Type
Tubular Furnace
Working Temperature
<=1200c
Heating Zone
Single Zone 457mm
Temperature Control Accuracy
+-1c
Temperature Control Method
Ai-Pid 30-Stage Process Curve, Can Store Multiple
Tube Material
High Purity Quartz
Sealing Mode
Stainless Steel Vacuum Flange
Vacuum Measurement
Mechanical Pressure Gauge
Gas Channels
Three-Way
Pressure Range
0.05~0.3MPa
Transport Package
Standard Export Wooden Packaging
Specification
890mm*950mm*1400mm
Trademark
CYKY
Origin
Zhengzhou, Henan, China
HS Code
8404102000
Production Capacity
5000pieces/Month

Product Description

1200 degree vacuum RTP annealing furnace Poly silicon wafers for solar cells with Infrared halogen tube lamp heating
Product Description

The halogen lamp RTP annealing furnace is a 6-inch wafer rapid annealing furnace. It adopts innovative heating technology to realize real substrate temperature measurement. It does not need the temperature compensation of traditional rapid annealing furnaces. The temperature control is accurate and the temperature is highly repeatable. Customers include many international semiconductor companies and well-known scientific research teams. It is an ideal choice for semiconductor annealing process.
Technical features:
Real substrate temperature measurement without traditional temperature compensation
Infrared halogen tube lamp heating
Extremely excellent heating temperature accuracy and uniformity
Fast digital PID temperature control
Stainless steel cold wall vacuum chamber
Good system stability
Compact structure, small desktop system
PC control with touch screen
Compatible with normal pressure and vacuum environment, the standard value of vacuum degree is 5×10-3 Torr, and the vacuum degree is as low as 5×10-6 Torr using two-stage molecular pump
Up to 3-channel gases (MFC control)
No cross contamination, no metal contamination.
Introduction of real substrate temperature measurement technology:


As shown in the figure above, the heat radiated by the array halogen lamp reaches the surface of the sample through the quartz window, and the sample is heated. The traditional rapid annealing furnace uses a thermocouple to measure the substrate temperature. Because the thermocouple is at a certain distance from the substrate, the measurement is not the substrate. The real temperature of the chip must be temperature compensated.

The halogen lamp RTP annealing furnace uses a dedicated flake-like Real T/C KIT for temperature measurement, as shown in the figure above, the contact thermometer is connected to the flake-like Real T/C KIT. The flake-like Real T/C KIT is located very close to the sample above when working, the array halogen lamp radiates heat to the sample surface through the quartz window, the sample is heated, and the flake-like Real T/C KIT is heated at the same time. Because the substrate is very close to the Real T/C KIT, there will be heat transfer between them, and the thermal equilibrium will be quickly reached, so the temperature measured by the flake-like Real T/C KIT is infinitely close to the real temperature of the substrate, thus realizing the real measurement of the substrate temperature.

Product Parameters

 

product name 1200ºC RTP Annealing furnace
Product number CY-RTP1000-Φ300-T
Substrate size 6 inches
Substrate base Quartz needle (optional SiC coated graphite base)
Temperature range 150-1200ºC
Heating rate 10-150ºC/S
Temperature uniformity ≤±1.5% (@800ºC, Silicon wafer)
≤±1.0% (@800ºC, Substrate on SiC coated graphite susceptor)
Temperature control accuracy ≤ ±3ºC
Temperature repeatability ≤ ±3ºC
Vacuum 5.0E-3 Torr / 5.0E-6 Torr
Gas supply Standard 1 channel N2 purge and cooling gas circuit, controlled by MFC (up to 3 channels can be selected)
Annealing duration ≥35min@1200ºC
Temperature control Fast digital PID control
Dimensions 890mm*950mm*1400mm


Substrate type:
Silicon wafers
Compound semiconductor wafers
GaN/Sapphire wafers for LEDs
Silicon carbide wafers
Poly silicon wafers for solar cells
Glass substrates
Metals
Polymers
Graphite and silicon carbide susceptors
Application areas:
Ion implantation/contact annealing, rapid thermal processing (RTP), rapid annealing (RTA), rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), can be used in different environments such as vacuum, inert atmosphere, oxygen, hydrogen, mixed gas, etc. SiAu, SiAl, SiMo alloying, low dielectric materials, crystallization, densification, solar cell bonding, etc.
Since the substrate is very close to the Real T/C KIT, there will be heat transfer between them, and the thermal equilibrium will be quickly reached, so the temperature measured by the chip Real T/C KIT is infinitely close to the real temperature of the substrate, thus realizing the substrate The real measurement of the chip temperature.

Detailed Photos

1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating

 



1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating

Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.

1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
1200 Degree Vacuum Rtp Annealing Furnace Poly Silicon Wafers for Solar Cells with Infrared Halogen Tube Lamp Heating
Q. Are you a manufacturer or a trading company?

A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?

A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?

A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?

A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?

A.T / T, L / C, D / P, etc., it is recommended to use Alibaba Trade Guarantee.

Q. How is the package of goods? Delivery methods?

A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service.

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