Laboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner

Product Details
Customization: Available
After-sales Service: Online Video
Warranty: 1 Year
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Year of Establishment
2013-07-17
Number of Employees
18
  • Laboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner
  • Laboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner
  • Laboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner
  • Laboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner
  • Laboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner
  • Laboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner
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Basic Info.

Model NO.
CY-P2L-A
Application
Textile Industry
Cleaning Media
Dry Cleaning
Automation
Automatic
Cleaning Precision
Ultra-Precision Industrial Cleaning
Control
PLC
Principle
Physical Cleaning
Certification
CE
Condition
New
Customized
Customized
Feature
Eco-Friendly
RF Frequency
40kHz/13.56MHz
Process Control
Manual/Automatic
Display
LCD
Certificate
CE/TUV
Transport Package
Wooden Box
Specification
plasma cleaner
Trademark
CY
Origin
Zhengzhou, China
HS Code
85141090
Production Capacity
210 Sets Per Month

Packaging & Delivery

Package Size
140.00cm * 100.00cm * 120.00cm
Package Gross Weight
150.000kg

Product Description

150W 2L plasma cleaner CY-PC13.56M-2L-150Q
150W 2L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.
 
Main parts Name 2L plasma cleaner (4 inch)
Chamber material High purity quartz
size Dia.120mm,height 280mm
RF power supply Power characteristics The power supply is an all-solid-state radio frequency power supply, using high-stability and high-reliability power amplifier modules and DC modules, which effectively guarantees the radio frequency power output of the power supply. The use of high-quality electronic components ensures the reliability of the product.
Advantage Can run normally for long time
Simple and flexible operation
High power efficiency and low heat generation
perfect reflected power protection function
RF power 0~150W continuously adjustable
Signal frequency 13.56MHz ±0.005%
Reflected power ≤3W
Power stability ±0.1%
Overall efficiency ≥75%
Harmonic component ≤-50 dBc
Cooling air
Gas detection Measuring parts Float flow meter/optional mass flow meter
Gas channel Two channels
A channel range 10~100ml/other ranges are optional
B channel range 16~160ml/other ranges are optional
Others Power supply AC220V 50/60Hz
Power 600W
Using temperature -10ºC -- 40ºC
Working vacuum ≤40Pa
Dimension 540mmX500mmX440mm
Weight 58kg(including package)
Laboratory Optical Glass Wafer Vacuum Plasma Etching CleanerLaboratory Optical Glass Wafer Vacuum Plasma Etching CleanerLaboratory Optical Glass Wafer Vacuum Plasma Etching Cleaner

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