• High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
  • High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
  • High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
  • High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
  • High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
  • High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film

High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film

After-sales Service: 1 Year
Warranty: 1 Year
Type: Coating Production Line
Coating: Vacuum Coating
Substrate: Steel
Certification: CE
Customization:
Diamond Member Since 2016

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  • Overview
  • Product Description
Overview

Basic Info.

Condition
New
Cooling Mode
Water Cooling
Water Chiller
Circulating Water Chiller with Flow Rate of 10L/Mi
Chamber Size
Dia.300mm*300mm
Chamber Material
Stainless Steel
Opening Mode
Top Cover Open
Backing Pump
Rotary Vane Pump
Ultimate Vacuum
1.0e-5PA
Transport Package
Wooden Case
Specification
Customized
Trademark
CYKY
Origin
Zhengzhou, China
HS Code
8416100000
Production Capacity
100pieces/Month

Product Description

High vacuum 4-inch three-target magnetron sputtering coater for Silicon carbide film 
Product Description

The three-target magnetron sputtering coater can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, etc. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material thin films in the laboratory. The three-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. The magnetron target is 4 inches, and customers can choose it according to the size of the substrate to be plated; the power supply is three 500W RF power supplies, which can be used for the preparation of non-metallic thin films, and the three targets can meet the needs of multi-layer or multiple coatings. The coater has a high-precision mass flowmeter. If the customer has other needs, the gas path of up to four mass flowmeters can be customized to meet the needs of complex gas environment construction; the instrument is equipped with an advanced turbomolecular pump group, and the ultimate vacuum can reach 1.0E-4Pa. At the same time, other types of molecular pumps are available for purchase. The gas path of the molecular pump is controlled by multiple solenoid valves, which can realize the opening of the cavity to take out the sample without turning off the pump, greatly improving your work efficiency. This product can be equipped with an all-in-one industrial computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve your experimental efficiency.
Dual-target DC magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Dual-target DC magnetron sputtering coater technical parameters:

Product Name Triple Target Magnetron Sputtering Coater
Model CY-MSH1000-III-RFRFRF-SS
Sample Stage Size 632*750
Rotational speed 1-20rpm adjustable
Magnetron Sputtering Target Quantity 4"×3
Cooling mode Water cooling
Water chiller Circulating water chiller with flow rate of 10L/min
Vacuum Chamber Chamber size Dia.1000mm*800mm
Chamber material Stainless steel
Watch window Dia.100mm
Opening mode Front door open
Mass Flow Meter Single channel, 0-200SCCM for Ar
Vacuum System Backing pump Rotary vane pump, 8.3L/s
Secondary pump Molecular pump, 300L/s
Ultimate vacuum 1.0E-3Pa
Pumping interface ISO160
Exhaust interface K16F
Vacuum measurement Compound vacuum gauge
Power supply AC220V, 50/60Hz
RF Power Supply Quantity RF power supply*3
Max output power 0-500W
Other parameters Supply voltage AC220V,50Hz
Total power 8KW
Overall size 2020*1785*1860mm
Total Weight About 500kg
Dual targets magnetron sputtering coater product pictures:
High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide FilmHigh Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film

High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film

Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.
High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film
High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film

Q. Are you a manufacturer or a trading company?

A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?

A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?

A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?

A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?

A.T / T, L / C, D / P, etc., it is recommended to use Trade Guarantee.

Q. How is the package of goods? Delivery methods?

A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service

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