• Pecvd Plasma Enhanced Chemical Vapor Deposition
  • Pecvd Plasma Enhanced Chemical Vapor Deposition
  • Pecvd Plasma Enhanced Chemical Vapor Deposition
  • Pecvd Plasma Enhanced Chemical Vapor Deposition
  • Pecvd Plasma Enhanced Chemical Vapor Deposition
  • Pecvd Plasma Enhanced Chemical Vapor Deposition

Pecvd Plasma Enhanced Chemical Vapor Deposition

After-sales Service: 1 Year
Warranty: 1 Year
Application: Industry, School, Lab
Customized: Customized
Certification: CE
Structure: Desktop
Customization:
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
Overview

Basic Info.

Model NO.
CY-PECVD-240
Material
Stainless Steel
Type
Tubular Furnace
RF Power Supply Cooling Method
Air-Cooling
Heating Zone
Single Heating Zone 200mm
Temperature Accuracy
+-1c
Furnace Tube Material
High Purity Quartz
Furnace Tube Size
Dia. 50*1200mm
Adjustable Speed
0-20rpm
Transport Package
Standard Export Wooden Packaging
Trademark
CYKY
Origin
Zhengzhou Henan China
HS Code
8401200000
Production Capacity
50sets Per Month

Product Description

PECVD Plasma Enhanced Chemical Vapor Deposition for Amorphous silicon and microcrystalline silicon films
Product Description

CY-PECVD-240 chemical vapor deposition using plasma enhanced chemical vapor deposition technology, low basic temperature, fast deposition rate, deposition of silicon nitride, amorphous silicon and microcrystalline silicon films on optical glass, silicon, quartz, stainless steel and other substrate materials, good film forming quality, fewer pinholes, not easy to crack. It is suitable for the preparation of amorphous silicon and microcrystalline silicon thin film solar cell devices, and can be widely used in the research and small batch preparation of thin film materials in colleges and universities and scientific research institutes.

Main functions and characteristics:


PECVD equipment uses the principle of flat plate capacitive glow discharge to dissociate the process gas passing into the deposition chamber and generate plasma. The dissociated groups re-react chemically in the plasma. Due to the presence of plasma, the decomposition, combination, excitation and ionization of gas molecules are promoted, and the formation of reactive groups is promoted, thus reducing the deposition temperature. A film is deposited on a substrate at a certain temperature. The density and energy of the plasma can be adjusted according to the process, and the growth rate and microstructure of the film can be controlled.

Product Parameters
Product model CY-PECVD-240 chemical vapor deposition equipment
Installation condition The equipment is required to be used at an altitude of less than 1000m, at a temperature of 25 ° C ±15 ° C, and at a humidity of 55%Rh±10%Rh.
1, water: The equipment is equipped with self-circulating cooling machine (filled with pure water or deionized water)
2, electricity: AC220V 50Hz, must have good grounding
3. Gas: Nitrogen/argon (purity above 99.99%) should be filled in the equipment chamber, and the gas cylinder required for the experiment should be prepared by itself (with Ø10mm double sleeve joint) and pressure reducing valve
4, ventilation device: required
Main feature 1. Low film forming temperature required
2. Fast deposition rate and wide application
3. Small size, easy to operate
4. Easy to control using radio frequency as the enhancement source
5. Easy to clean and install.
6. Integrated touch screen control
Radio frequency power supply Signal frequency: 13.56MHz±0.005%
Power output: 0~500W
Reflected power: <3W (maximum power)
Power stability: ±0.1%
Vacuum chamber The capacitive coupling mode is adopted with the sample table at the bottom and the gas supply nozzle at the top.
Sample heating: RT-1000ºC above, temperature control accuracy: ±1°C
Sample speed: adjustable speed: 1-20rpm adjustable
Spray head: Φ100mm spacing 40-100mm online continuous adjustable
Sample stand: Diameter 100mm
Vacuum chamber: front door type, φ245mm X 300mm stainless steel
Observation window: φ100mm with baffle
Gas supply system Measuring range
Channel A: 0 ~ 200SCCM, Ar gas
Channel B: 0 to 200SCCM, O2 gas
Channel C: 0 ~ 200SCCM, N2 gas
Liquid source: Argon or nitrogen
Connector specification :6.35mm sleeve connector
Vacuum system Port Type Suction port: KF40;Exhaust port: G1"
Exhaust velocity
Nitrogen: 60L/S
Nitrogen with protective net: 55L/S
Bearing type: Ceramic bearing, grease lubricated
Cooling method: forced air cooling
Speed: 69000rpm
Startup time: 1.5 to 2 minutes
Stop time: 15 to 25 minutes
Compression ratio N2:2x 107
Compression ratio H2:3x 103
Max. allowable back pressure: 800Pa
Bearing life: 20000 hours
Molecular pump controller: TC75
Auxiliary pump type: two-stage rotary vane vacuum pump
Exhaust speed: 160L/min
Deposition studio 0.133-40Pa(Can be adjusted according to the process)
Vacuum gauge Combined vacuum gauge
Water cooler Water flow rate: 10L/min;Power: 0.1Kw
Cooling water temperature: <37ºC
Warranty period The standard warranty period is 1 year
Detailed Photos

 

Pecvd Plasma Enhanced Chemical Vapor DepositionPecvd Plasma Enhanced Chemical Vapor DepositionPecvd Plasma Enhanced Chemical Vapor Deposition


Pecvd Plasma Enhanced Chemical Vapor Deposition
Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.

Pecvd Plasma Enhanced Chemical Vapor Deposition
Pecvd Plasma Enhanced Chemical Vapor Deposition
Pecvd Plasma Enhanced Chemical Vapor Deposition

Q. Are you a manufacturer or a trading company?
A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?
A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?
A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?
A.T / T, L / C, D / P, etc., it is recommended to use Alibaba Trade Guarantee.

Q. How is the package of goods? Delivery methods?
A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service


 

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