Two Channels Ald 4" Tube Furnace for CVD Growth of Nanomaterial

• Type: Stainless Steel Heating Equipment
• Certification: CE
• Structure: Horizontal Type
• Pressure Gauge: Anti-Corrosive
• Max. Temperature: 1100c
• Liquid-Vapor Generator: Automatic
• Model NO.: CY-1200X-4
• Ald Valve: Two
• Warranty: One Year
• Name: Ald Tube Furnace
• Transport Package: Wooden Box
• Specification: dia. 100mm
• Trademark: CY
• Origin: Zhengzhou, China
• HS Code: 85141090
• Production Capacity: 210 Sets Per Month

Product Description

Two Channels ALD 4" Tube Furnace System Upto 1200oC
is a 4" tube furnace combining with two channel ALD valves and one channel liquid vapor delivery( Atomic Layer Deposition ) and as well as four channels gas delivery system for CVD growth of nanomaterial and pi film.The smart design makes ALD more cost effective and affordable for every research group.
 

Control Panel	All parameters of Vapor , ALD, and  Gas flow are controlled by PLC via a 6" touch screen panel in a mobile cart  Two Channel ALD valve For channels MFC gas delivery
ALD valve	Two ALD valves with pulse controller  (min 10 ms duration ) Capable of heating with thermal actuators
Liquid-Vapor Generator	Automatic liquid vapor generator is included and connect to  ALD valve
Dual Zone Split Tube furnace	Max 1100ºC for continuous heating Two programmable precision digital temperature controllers with 30 segments. Two separate controlled Heating Zones 200mm length for each heating zone 400mm total in heating length 250mm constant central temperature heating area if both zones were heated at the same temperature 500ºC max temperature difference between two zones with thermal blocks in between Input power: 208 - 240V AC input, single phase at max. 4KW Optional:  ALD control system can be installed with a short tube furnace as picture belo
Anti-corrosive Pressure Gauge	3.8x10^-5 to 1125 Torr measurement range Anti-corrosive, gas-type independent  High accuracy and reproducibility at atmosphere for reliable atmospheric pressure detection Fast atmospheric detection eliminates waiting time and shortens process cycle Easy to exchange plug & play sensor element
Vacuum Pump  ( optional)	10E-2 Torr vacuum can be achieved inside processing tube Vacuum pump is not included ,suggest you order a dry pump for CVD process
More Bubbler Optional	bubbler or evaporator for CVD Could add Quartz Crystal and thermocouple to monitoring thin film thickness and temperature at extra cost
Update Idea	You may use ALD Device to build hybrid Plasma enhanced ALD+ CVD  and ALD+PVD+CVD system to grow complex materials
Warranty	One year limited warranty with lifetime support