Henan, China
Business Type:
Manufacturer/Factory & Trading Company
Business Range:
Chemicals, Electrical & Electronics, Health & Medicine, Industrial Equipment & Components, ...
Main Markets:
North America, South America, Europe, Southeast Asia/ Mideast, Africa, East Asia(Japan/ ...
Terms of Payment:
LC, T/T, D/P, Western Union
OEM/ODM Service

Plasma Sputtering Coater, DC Plasma Sputtering Coater, Plasma Sputtering &Evaporation Coater manufacturer / supplier in China, offering Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-Cy-600-2HD, New Design Desktop Large Automatic Vacuum Spin Coater, Dual Function Soft Metal Sintering Furnace for Zirconia Blocks and Alloy Disc and so on.

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Supplier Homepage Products Film Coating Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-Cy-600-2HD

Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-Cy-600-2HD

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Min. Order: 1 Piece
Port: Zhengzhou, China
Production Capacity: 20 Sets/Month
Payment Terms: T/T, Western Union
Customized: Customized
Structure: Desktop
Material: Steel
Certification: CE, TUV
Application: School, Lab
Type: Plasma

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Basic Info

Model NO.: CY-600-2HD
Trademark: CYKY
Transport Package: Ply Wooden Carton
Origin: Zhengzhou, China
HS Code: 8486109000

Product Description

Breif Introduction

  CY-600-2HD is a compact magnetron sputtering system with dual 2" target sources.The DC source for metallic film coating, and the other RF source for non-metallic material coating . This coating system is designed for coating both single or multiple film layers, such as alloy, ferroelectric, semiconductor, ceramic etc 's film coating

Technical Parameters

Input Power1.220VAC 50/60Hz, single phase
2.2000W  (including pump)
Source Power1.Two sputtering power sources are integrated into one control box
2. DC source: 500W for coating metallic materials
3.RF source: 600W with automatching for coating non-metallic materials ( Center)
4.Compact 300 RF source is available at extra cost
Magnetron Sputtering  Head1.Two 2" Magnetron Sputtering  Heads with water cooling jackets are included  
One is connected to RF power supply for no-conductive materials  
Another is connected to DC sputtering power source for coating metallic materials
2.Target size requirement: 2" diameter
3.Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets
4.One stainless steel and one Al2O3 ceramic targets are included for demo testing
5.Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally 
controlled recirculating water chiller is included for cooling both magnetron
6.Customized coater: Two DC head without, RF sputtering,  RF head without 
DC sputering,3 RF head are available upon request
Vacuum Chamber1.Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel
2.Observation Window:  100 mm diameter
Sample Holder1.Sample holder size: 140mm dia. for. 4" wafer max
2.Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating
3.The holder temperature is adjustable from RT to 500°C Max with 
accuracy +/- 1.0 °C
Gas Flow Control1.Flow rate:  200 ml/min max.
2.Flow rate is adjustable on the 6" touch screen control panel
Vacuum Pump StationHigh speed turbo vacuum pump system is directly installed on the vacuum
 for max. vacuum level 
Heavy duty dual stage mechanical pump is connected to turbo pump for faster 
pump speed
Mobile pump station is included and the compact sputtering coater can be put on
top of station
Max. vacuum level: 10^-6 torr with chamber baking     
Thickness MonitorOne Precision quartz thickness sensor is built into the chamber to monitor coating 
thickness with accuracy 0.10 Å  
LED Display Unit outside chamber can:
Input material to be coated according to data base included
Display total thickness coated and coating speed
 5 pcs quartz sensors (consumable) are included 
Water cooling is required
Overall DimensionsL6600mm× W660mm× H1200mm
Application NoteIn order to remove oxygen from the chamber,  suggest you use 5% Hytrogen + 95 % 
Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm
Please use > 5N purity Argon gas for plasma sputtering.  Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O
Net Weight160 kg
WarrantyOne years limited warranty with lifetime support

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