1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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  • 1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace
  • 1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace
  • 1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace
  • 1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace
  • 1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace
  • 1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
  • Packaging & Shipping
  • Company Profile
  • FAQ
Overview

Basic Info.

Model NO.
CY-PECVD-50R-1200-Q
Coating
Vacuum Coating
Substrate
Steel
Certification
CE, RoHS
Condition
New
Product Name
Pecvd Tube Furnace
Keywords
Pecvd
Tube Size
50mm
Tube Length
800mm
RF Power
150W
Heating Zone
200mm
Rotary
1-20rpm
Gas System
Mass Flow Meter
Tube Material
Quartz
Transport Package
Wooden Box
Specification
1300*1000*1800mm
Trademark
CYKY
Origin
China
HS Code
8479899990
Production Capacity
20 Sets Per Month

Product Description

1200C single hetaing zone plasma enchanced chemical vapor deposition PECVD CVD tube furnace
Product Description

Plasma-enhanced chemical vapor deposition (PECVD) is a type of chemical vapor deposition characterized by the use of plasma activation at low temperatures to enhance the chemical vapor deposition reaction. The advantages of this method are that the deposition temperature is low, the deposition rate is fast, and the film produced has excellent electrical properties, good substrate adhesion and excellent step coverage.

PECVD vapor deposition application areas:

Plasma enhanced CVD systems can be used in: graphene preparation, sulfide preparation, nanomaterials preparation and other test sites. A variety of films such as    SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano -silicon, SiC, diamond-like, etc. can be deposited on the surface of flake or similar shape samples, and P -type and N-type doped films can be deposited. The deposited film has good uniformity, compactness, adhesion and insulation. Widely used in cutting tools, high-precision molds, hard coatings, high-end decoration and other fields, PECVD vapor deposition  has a wide range of applications in ultra -large scale integrated circuits, optoelectronic devices, MEMS and other fields.

Product Parameters

Technical data of PECVD:

RF power supply Output Power 150W
Output accuracy ±1%
RF frequency 13.56MHz
RF stability ±0.005%
Cooling method   Air-cooling
1200ºC Single heating zone tube furnace Supply voltage AC220V, 50Hz
Maximum power 2KW
Heating zone Single heating zone 200mm
Working temperature Maximum 1200ºC, continuous operating temperature should be ≤1100 ºC
Temperature accuracy ± 1 ºC
Temperature control method AI-PID 30-stage process curve, can store multiple
Three temperature zone independent control, with overheat and thermocouple failure protection
Furnace tube material High purity quartz
Furnace tube size Dia. 50x800mm
Sealing method Vacuum stainless steel flange, KF16 flange
Adjustable speed 0-20rpm
Furnace tilt angle 0-15°
Vacuum pump Rotary vane mechanical pump
Ultimate vacuum 1.0E-1Pa
Feeding method Vacuum funnel and screw feed
Detailed Photos

1. WE have CVD/PECVD machine with gas supply system+vacuum system+tube furnace + plasma generator.

2. Tube furnace (temperature) :1200C, 1400C, 1600C, customized temperature is available.

3. Tube furnace (heating zone) :single zone, dual zone, triple zone, customized No. of heating zone is available.

4. Tube Material: quartz, corundum, alloy, and other material of tube is customization.

5. Tube with different diameter and length is customization.

6. Plasma generator:  150W, 300W, 500W, 1000W, and other power of plasma generator is customization.

7. Flow meter
: 1~3 or multi channel flow meter is optional based on your process.

8. Customized CVD/PECVD system according to your reswarch process is available.
1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace
1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace

Packaging & Shipping

We can ship the PECVD reactor by air by sea, also can arrange shipment according to your requirements.
1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace

Company Profile

Zhengzhou CY Scientific Instrument Co., Ltd. is a comprehensive company integrating design, research and development, production and sales.
Our main products are: spin coater, thermal evaporation coater, magnetron sputter coater, plasma sputter coater, E-beam evaporation coater, PLD pulse laser coating machine, plasma cleaner, CVD system, PECVD system, diamond wire cutting machine, melting furnace/stove, arc melting furnace, etc.
Our products are widely used in the field of materials science research. We have extensive cooperation with domestic universities, laboratories, and new material companies. It has been successfully exported to more than 20 countries and regions including the United States, the United Kingdom, Germany, Russia, Switzerland, Canada, Brazil, etc. and have established long-term cooperative relationships with local dealers.
If you are conducting materials research, please contact us and we will provide you with customized services to make your research experiments smoother!

1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace1200c Single Hetaing Zone Plasma Enchanced Chemical Vapor Deposition Pecvd CVD Tube Furnace

FAQ

Q. Are you manufacturer or trading company?
A. We are professional manufacturer of  laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service. 

Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.

Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.

Q. How to pay?
A. T T, L / C, D / P, etc.

Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.

 

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