| Customization: | Available |
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| After-sales Service: | Full Time Technical Support |
| Warranty: | One Year |
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This is a laboratory coater with four target positions. The equipment is equipped with HiPIMS, DC and RF power supply and can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Specifications
| Input power supply |
Single phase AC220V, 50 Hz
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| Magnetron sputtering guns |
Part quantity: total 4 sets (2 sets for RF sputtering, 1 set for HiPIMS and pulse DC sputtering, 1 set for conventional DC sputtering)
Applicable target sizes: diameter 3inches, max. thickness 3mm
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| RF power supply |
Part quantity: 2 sets (for RF sputtering)
Output power: max.500W
RF frequency: 13.56 MHz
Matching method: auto-matching network system
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| HiPIMS power supply |
Part quantity: 1 set (for HiPIMS and pulse DC sputtering)
Max. output power: 1KW
Pulse frequency range: 20~20000Hz
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| DC power supply |
Part quantity: 1 set (for conventional DC sputtering)
Max. output power: 500W
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| Vacuum system |
Backing pump: pumping speed 8.3L/s
Turbo-molecular pump: pumping speed 1200L/s
Base pressure of chamber: 5.0*10-4Pa composite vacuum gauge, range 10-5Pa~105Pa |
| Vacuum chamber |
Chamber structure: D-type front door opening structure
Chamber material: 304 stainless steel
Chamber size: ~φ600mm×H500mm
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| Sample holder |
Dimension: φ150mm
Rotating speed: 0~20rpm
Heating temperature: RT~500ºC
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| Bias power supply |
Part quantity: 1 set
To provide plasma pre-cleaning function of substrate
Output power: ≤1KW
Frequency: 40Khz
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| Gas control system |
Three-channel mass flow controller (MFC), software-controlled
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| Film thickness controller |
Channel numbers: two channels
Function: to measure the film thickness
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| Circulating water chiller |
Part quantity: 1 set
Flow rate: 10L/min
Cooling water: purified water or deionized water
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| Air compressor |
Rated discharge pressure: 0.7Mpa
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| Operation and control system |
14.3" touch screen
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