• Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films
  • Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films
  • Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films
  • Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films
  • Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films
  • Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films

Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films

After-sales Service: 1 Year
Warranty: 1 Year
Type: Coating Production Line
Coating: Vacuum Coating
Substrate: Steel
Certification: CE
Customization:
Diamond Member Since 2016

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  • Overview
  • Product Description
Overview

Basic Info.

Model NO.
CY-MSH325-III-DCDCRF-SS
Condition
New
Cooling Mode
Water Cooling
Water Chiller
Circulating Water Chiller with Flow Rate of 10L/Mi
Chamber Size
Dia.300mm*300mm
Chamber Material
Stainless Steel
Opening Mode
Top Cover Open
Backing Pump
Rotary Vane Pump
Ultimate Vacuum
1.0e-5PA
Transport Package
Wooden Case
Specification
Customized
Trademark
CYKY
Origin
Zhengzhou, China
HS Code
8416100000
Production Capacity
100pieces/Month

Product Description

Horizontal high vacuum three-target magnetron sputtering coater for alloy thin films 
Product Description

The three-target magnetron sputtering coater can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, etc. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material thin films in the laboratory. The three-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customizability. The magnetron target is 2 inches, and customers can choose it according to the size of the substrate to be plated; the power supply is two 500W DC power supplies and one 300W RF power supply. The DC power supply can be used for the preparation of metal films, and the two targets can meet the needs of multi-layer or multiple coatings. The coater has two high-precision mass flow meters. If the customer has other needs, the gas path of up to four mass flow meters can be customized to meet the needs of complex gas environment construction; the instrument is equipped with an advanced turbomolecular pump group as standard, and the ultimate vacuum can reach 1.0E-5Pa. At the same time, other types of molecular pumps are available for purchase. The gas route of the molecular pump is controlled by multiple solenoid valves, which can open the cavity to take out the sample without turning off the pump, greatly improving your work efficiency. This product can be equipped with an all-in-one industrial computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve your experimental efficiency.
Dual-target DC magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Dual-target DC magnetron sputtering coater technical parameters:

Product name Horizontal high vacuum three-target magnetron sputtering coater
Product model CY-MSH325-III-DCDCRF-SS
Power supply voltage AC220V,50Hz
Complete power 6KW
System vacuum <=5×10-4Pa
Sample stage Dimensions φ150mm
Heating temperature <=850ºC
Temperature control accuracy ±1ºC
Adjustable speed <=20rpm
Magnetron Sputtering Target Target size Diameter Φ50.8mm, thickness <=3mm
Cooling mode Circulating water cooling
Water flow size Not less than 10L/Min
Quantity 3
Vacuum chamber Cavity size Diameter φ325mm
Cavity material SUU304 stainless steel
Observation window Diameter φ100mm
Opening method Top opening
Gas control 1 mass flow meter is used to control Ar flow, with a range of 200SCCM
Vacuum system Equipped with 1 molecular pump system, gas pumping speed 600L/S
Film thickness measurement Optional quartz crystal film thickness meter, resolution 0.10 Å
Sputtering power supply Equipped with DC power supply, power 500W*2 RF power supply 300W
Control system CYKY self-developed professional control system
Equipment dimensions 570mm×1040mm×1700mm
Equipment weight 250kg
Dual targets magnetron sputtering coater product pictures:
Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin FilmsHorizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin FilmsHorizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin FilmsHorizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films



Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films

Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.
Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films
Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films
Horizontal High Vacuum Three-Target Magnetron Sputtering Coater for Alloy Thin Films

Q. Are you a manufacturer or a trading company?

A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?

A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?

A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?

A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?

A.T / T, L / C, D / P, etc., it is recommended to use Alibaba Trade Guarantee.

Q. How is the package of goods? Delivery methods?

A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service

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