Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer

Product Details
Customization: Available
Application: School, Lab
Customized: Customized
Manufacturer/Factory & Trading Company

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  • Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
  • Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
  • Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
  • Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
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Basic Info.

Model NO.
CY-VHSP
Certification
CE, TUV
Structure
Desktop
Material
Steel
Type
Heating Mantle
Rotating Speed
0~10000rpm
Accelerated Speed
100~5000rpm/S
Speed Resolution
1rpm
Single Step Time
3000s
Keywords
Vacuum Heat Spin Coater
Warranty
One Year
Transport Package
Wooden Box
Specification
100mm
Trademark
CY
Origin
Zhengzhou, China
HS Code
8486109000
Production Capacity
210 Sets Per Month

Product Description

Vacuum heating type spin coater
The vacuum heating type spin coater mainly uses the centrifugal coating principle to coat a liquid or colloidal material on the substrate such as silicon wafer, crystal, quartz, ceramic and so on to form a thin film, and the film has a wide application in the field of material research. The working chamber of the heating type spin coater is made of polytetrafluoroethylene (plastic king) material, which is a polymer compound formed by polymerization of tetrafluoroethylene, which has excellent chemical stability and strong corrosion resistance. It is widely used in a variety of applications requiring acid and alkali resistance and organic solvents.
Vacuum heating type spin coater product features:

1. The surface of the coating can be heated at a constant temperature. The heating range is from room temperature to 120 °C, and the temperature control precision is 0.1 °C.
2. It can be used to uniformly coat organic matter for film preparation.
3. You can first be spin coating, and then bak it.
4. Rotating coating process parameters for a variety of different substrates can be stored. Each coating process can be set up with multiple different rotational speeds.
5. The working chamber is made of polypropylene (PP) material.

 
Item   Detals
rotating   speed 0~10000rpm
accelerated speed 100~5000rpm/s
Speed   resolution 1rpm
Single step time 3000s
Voltage   input AC220V  50Hz

Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer
Laboratory Programmable Vacuum Heat Spin Coater for Silicon Wafer


 

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