• Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers
  • Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers
  • Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers
  • Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers
  • Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers
  • Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers

Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers

Type: Coating Production Line
Coating: Vacuum Coating
Substrate: Aluminum
Certification: CE
Condition: New
Power: 2kw
Customization:
Diamond Member Since 2016

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Manufacturer/Factory & Trading Company

Basic Info.

Model NO.
CY-VTC16-3HD
Target Diameter
Dia. 47mm, Thickness 0.5-3mm
Target Material
Au, AG, PT, Cr, Ni Are Available
Transport Package
Wooden Case
Specification
Coating Chamber Dia. 160*120mm
Trademark
CY
Origin
Henan, China
HS Code
8486202200
Production Capacity
100/Month

Product Description

Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers
This three-target plasma coater is a small-size laboratory coater (common type with direct current) developed by our company, which can save the space. By adopting touch-screen control panel, the operation is more simple and convenient. The diameter of a sample table can be 50 mm, and the heating temperature can be 500 ºC. The CY-VTC16-3HD three-target plasma coating device can coat Au, Ag, Cu and other target materials, as well as the sample table can be rotated to coat the same sample with three thin film at one time.

Features of three-target plasma coating machine CY-VTC16-3HD:

1: PLC touch screen control panel, 7-inch touch screen, PID temperature control mode.

2. Vacuum degree, current, target position and substrate heating temperature can be controlled.

3: It can be connected with vacuum pump and stainless steel corrugated pipe through KF25 quick connection flange.

4: This plasma sputter coating device has passed CE certification.

Product parameters

Input Power

220V 50Hz , single phase

2000W (including pump)

Output Voltage

1600V DC

Output Current

50mA (Max.) 

Coating Cavity 

Φ160×120mm

Sample Table 

Φ50mm (optional heating sample, temperature can be as high as 500 ºC, sputtering time is 5 minutes at most)

Vacuum Pump

120L/M Rotary-vane Vaccum Pump

 Air Inlet

Equipped with precision adjustable needle valve, easy to adjust the air intake

Target Diameter

Φ47mm, Thickness 0.5~3mm

Target Material

Au,Ag,Pt,Cr,Ni are available

Optional accessories

1:KF25Quick connection flange

2:Stainless steel corrugated pipe (600mm) 

3:Rotary-vane Vaccum Pump

4:A variety of high purity metal targets such as Pt,Ag,Zn. 

5:Heating sample table

Partial Company Products

Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers

Contact Information:
 
Tel.: 86-13838579492
 
 

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