| Customization: | Available |
|---|---|
| Type: | Coating Production Line |
| Coating: | Vacuum Coating |
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Vacuum Plasma Sputtering Coater with Three Rotary Targets for Wafers
This three-target plasma coater is a small-size laboratory coater (common type with direct current) developed by our company, which can save the space. By adopting touch-screen control panel, the operation is more simple and convenient. The diameter of a sample table can be 50 mm, and the heating temperature can be 500 ºC. The CY-VTC16-3HD three-target plasma coating device can coat Au, Ag, Cu and other target materials, as well as the sample table can be rotated to coat the same sample with three thin film at one time.
Features of three-target plasma coating machine CY-VTC16-3HD:
1: PLC touch screen control panel, 7-inch touch screen, PID temperature control mode.
2. Vacuum degree, current, target position and substrate heating temperature can be controlled.
3: It can be connected with vacuum pump and stainless steel corrugated pipe through KF25 quick connection flange.
4: This plasma sputter coating device has passed CE certification.
Product parameters
|
Input Power |
220V 50Hz , single phase |
|
2000W (including pump) |
|
|
Output Voltage |
1600V DC |
|
Output Current |
50mA (Max.) |
|
Coating Cavity |
Φ160×120mm |
|
Sample Table |
Φ50mm (optional heating sample, temperature can be as high as 500 ºC, sputtering time is 5 minutes at most) |
|
Vacuum Pump |
120L/M Rotary-vane Vaccum Pump |
|
Air Inlet |
Equipped with precision adjustable needle valve, easy to adjust the air intake |
|
Target Diameter |
Φ47mm, Thickness 0.5~3mm |
|
Target Material |
Au,Ag,Pt,Cr,Ni are available |
|
Optional accessories |
1:KF25Quick connection flange 2:Stainless steel corrugated pipe (600mm) 3:Rotary-vane Vaccum Pump 4:A variety of high purity metal targets such as Pt,Ag,Zn. 5:Heating sample table |
Partial Company Products
Contact Information:
Tel.: 86-13838579492
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