High Vacuum Dual Targets Magnetron Sputtering Coater with Transmission and Processing of Samples Chamber Body

• After-sales Service: Online Support
• Warranty: 1 Year
• Customized: Non-Customized
• Structure: Desktop
• Material: Stainless Steel
• Certification: CE
• Model NO.: CY-MSP-300
• Application: School, Lab
• Type: Film Applicator
• Sputtering Vacuum Chamber: 400xh520mm
• Sealing Method: Fluorine Rubber Seal
• Sample Holder: Dia. 150mm
• Heating Temperature: Rt~ 500c
• Magnetron Sputtering Gun: 3 Sets
• Target Dimension: Diameter 2′′, Thickness Max.3m
• Molecular Pump Speed: 600 L/S
• Transport Package: Wooden Case
• Specification: Film Applicator
• Trademark: CYKY
• Origin: China
• Production Capacity: 10 Sets Per Month

Product Description

Three target Ion source magnetron sputtering coating instrument with Transition chamber body

Product introduction: 
this equipment is three target magnetron sputtering coater apparatus, which can be used for the preparation of metal thin films. It has applications in the fields of electronics, optics, and special ceramic preparation. It can also be used for laboratory SEM sample preparation.
The three target magnetron sputtering coater is equipped with two magnetron targets and two sets of DC power supplies and one set Ion source system, which can be used to coat multilayer conductive metal films. At the same time, the equipment has two parts: a main chamber and a transition chamber. The transition chamber is equipped with a magnetic push rod, and a vacuum gate valve is installed between the two chambers; The user can load samples in the transition chamber while performing sputtering work in the main chamber, and perform vacuum pre-pumping. After the sputtering in the main chamber is completed, the sample can be pushed into the sample stage of the main chamber through the magnetic push rod. Such a design can reduce the number of vacuum pumping times in the main chamber, which not only effectively saves time, but also ensures a better local vacuum and effectively improves the quality of the coating.
 

Three target magnetron sputtering coater technical tarameters:

Working Voltage		AC 220V, 60Hz
Sputtering Vacuum Chamber		Dimension: ~ φ400xH520mm Material: 304 stainless steel  Inner wall processing: electrolytic polishing Sealing method: Fluorine rubber seal  Viewport (window): ~4'' (100mm) with shutter
Sample Holder		Center bottom setting sample holder,   with one shutter  Sample holder: Dia. 150mm  Rotary speed: 0~20rpm adjustable  Heating temperature: RT~   500^oC
Magnetron Sputtering Gun		Quantity: 3 sets Adjustable angle -45°~45° Sputtering orientation downwards  Target dimension:   diameter 2'', thickness max.3mm
Quartz   Crystal Monitor		Channel numbers: One-channel  Accuracy: 0.1Ã Measurement speed: 100mS-1S adjustable Measurement range: 500 000Ã (Aluminum as a   reference)  Standard sensor quartz crystal: 6MHz
Vacuum   System	Backing Pump	Double-stage rotary vane pump  Pumping rate:   1.1L/s
	Molecular Pump	Pumping rate: 600 L/s  Rated rotating speed: 27000rpm Starting time: <5min Cooling method: water cooling Vacuum degree:   5*10^-4Pa
	Composite Vacuum Gauge	Resistance   gauge + ionization gauge Measuring   range: 10^-5Pa ~ 10^5 Pa
DC Power Supply		Quantity: 2 sets  Output power: 0~500W Output voltage: 0~600V Maximum output current: 1A Starting time: 1~10s
RF power supply		Quantity: 1 set Output power: 0~500W RF frequency: 13.56 MHz Matching method: automatch Reflected power: <=100W Power stability: ±0.1%   If need cleaning function, extra add Bias power supply generator
Ion source components and power supply		Main technical parameters of ion source: 1. The diameter of the ion source: 60mm 2. Ion energy: 200-1500eV 3. Ion source beam current: 10-40mA/min 4.Uniform zone: φ10cm 5. Working gas: argon/oxygen/nitrogen 6. Recommended vacuum chamber size: ≤Φ500mm 7. Cathode Gap Width: 3mm 8. Discharge Voltage:>300V, Voltage adjustable
Mass Flow Controller		One-channel MFC for Ar gas Measuring range: 0~200sccm  It could add several channels flowmeter, extra order.
Water Cooler		Flow rate: 13L/min Power: 0.5KW Cooling power: 50W/ºC Tank capacity: 9L
Control		PLC automatic control
Transition chamber		The chamber size will be for max. 4inch wafers. Equipped with one compact molecular pump group Backing pump: VRD-4, pumping speed: 1.1L/s Model of molecular pump: TG60F Pumping speed of molecular pump: 60L/s