| Customization: | Available |
|---|---|
| Type: | Coating Spray Gun |
| Coating: | Vacuum Coating |
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Three Targets Magnetron Sputtering Coater with RF/DC Power Supply for Co-sputtering up to Three Substrates and Wafers
VTC-600-3HD is a combinatorial plasma sputtering system with three 2'' magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.
Specifications
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Input Power |
Single phase 220 VAC 50/60 Hz 2000 W (including vacuum pump and water chiller) |
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Source Power |
Three sputtering power sources are integrated into one control box. DC source: 500 W power for coating metallic materials RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials |
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Magnetron Sputtering Head |
Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included One Sputting Head Model also available. Target size requirement: 2" diameter Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate) One Stainless Steel Target and one Research Grade Al2O3 target are included for demo testing Optional 2" sputtering targets (or backing plate) are available upon request at extra cost. Recommended Sputtering Recipe and Useful Tips Customized coater: Two DC - One RF; Two RF - One DC; Three DC; Three RF Optional: 148 cm RF cable can be ordered at extra cost for replacement. |
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Vacuum Chamber |
Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement Hinged type lid with pneumatic power pole allows easy target change |
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Sample Stage |
Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover Sample holder size: 140 mm Dia. for. 4" wafer max Rotation speed: 1 - 20 rpm adjustable for uniform coating The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller |
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Gas Flow Control |
Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases Flow rate: 0 - 200 mL/min & 0 - 100ml/min adjustable on the touch screen control panel Air inlet valve is installed for vacuum release |
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Vacuum Pump Station |
A mobile pump station is included. The sputtering coater can be placed on top of station High-speed turbo pump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed Standard vacuum level connected with chamber: < 4.0E-5 Torr. . (1.0E-6 Torr with chamber baking ) If choose a 150L/S high speed turbo pump, vacuum can reach 10-6 torr with chamber ( 6x10-7 torr with baking) For the ultra-high vacuum upto 10^-7 torr, a getter pump (100L/s H2 & O2) is needed in addition to the turbo pump. |
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Water Chiller
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One digital temperature controlled recirculating water chiller is included. Refrigeration range: 5~35 °C Flow rate: 16 L/min Pump pressure: 14 psi |
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Overall Dimensions |
Lid closed: 48" × 28" × 32" Lid open: 48" × 28" × 37" |
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Net Weight of Coater |
160 kg |
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Shipping Weight & Dimensions |
Total 3 Pallets 365 lbs, 48" x 40" x 45" 390 lbs, 48"x 40" x 49" 210 lbs, 48" x 40"x 30" |
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Compliance |
CE certified |
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Warranty |
One year limited warranty with lifetime support |
Detailed Pictures
Packaging & Shipping:
Plastic paper inside, polyfoam filled, wooden box outside or as your requirement.
Shipping and transportation as customer request. Generally, our mode of transport are by sea, by air or rail transport.
1. Reply your inquiry in 24 working hours.
2. Experienced staffs answer all your questions in fluent English.
3. Customized design is available.
4. Exclusive and unique solution can be provided to our customer by our well-trained and professional engineers and staff.
5. Professional factory : We are manufacturer, specializing in laboratory equipment.
Company InformationZhengzhou Tainuo Film Materials Co., Ltd. is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet. Our main products include: tube furnace, muffle furnace, plasma cleaner, vacuum furnace, atmosphere furnace, CVD system and customized lab equipment. Welcome to visit us.
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