| Customization: | Available |
|---|---|
| Cleaning Process: | Plasma Cleaning |
| Style: | Wafers |
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| Model | CY-P2L |
| Working Voltage | AC 220V 50Hz |
| Power | 550W |
| Chamber Dimension | 100mm*270mm |
| RF Frequency | 13.56MHz (±1%) |
| Working vacuum | 20~40Pa |
| Gas channel | 2 channel float flowmeter |
| Operation interface | Touch screen liquid crystal display |
| Output power | 0-150W continuously adjustable |
| Cleaning chamber material | high purity quartz, clean, anticorrosion |
| Vacuum pump | 4L/S double-stage rotary vane vacuum pump with anti-return oil device |
| Vacuum pump interface | KF16 |
| Vacuum gauge | Built-in high precision digital vacuum gauge |
| Timing function | Preset cleaning time |
| Working mode | Can be automatically and manually freely selected |
| Cleaning power | 0~150W can be adjusted freely |
| Cleaning gas | Argon, nitrogen, oxygen, clean air |
| Coupling method | Non-contact inductive coupling, can effectively prevent the sample from contaminating of electrode. |
| Operating temperature | 0-40 ° C (power supply / display) |
| Temperature range | 5%-85RH, no condensation |
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