Cyky-300-1HD Single Target Magnetron Sputtering Coater

• Customization: Available
• Type: Coating Spray Gun
• Coating: Vacuum Coating
• Model NO.: CYKY-300-1HD
• Certification: CE, TUV
• Condition: New
• Rated Power: 1200W
• Working Temperature: Rt-500c
• DC Sputtering Power: 500W
• RF Sputtering Power: 300W
• Sample Speed: 1rpm-20rpm
• Keywords: Single Target Magnetron Sputtering Coater
• Warranty: One Year
• Transport Package: Wooden Box
• Specification: dia. 140m
• Trademark: CY
• Origin: Zhengzhou, China
• HS Code: 8486202200
• Production Capacity: 210 Sets Per Month

Product Description

CYKY-300-1HD single target magnetron sputtering coater
CYKY-300-1HD single target magnetron sputtering coater is a high vacuum coating equipment independently developed by our company. It can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film and so on. The instrument is equipped with a magnetron sputtering target with a water-cooled interlayer and a 140mm heatable rotary object stage. The vacuum chamber adopts the top opening method, which makes it easier to change the target, and it is an ideal device for making various metal films. It is an ideal equipment for the preparation of films of various materials in the laboratory.
 

Product name	Single target magnetron sputtering coater
Product model	CYKY-300-1HD
Installation conditions	This equipment is required to be used at the altitude of 1000m or less, the temperature of 25ºC± 15ºC, and the humidity of 55% Rh ± 10% Rh. 1. Water: The equipment is equipped with a self-circulating chiller (filling pure water or deionized water) 2. Electricity: AC220V 50Hz, must have a good ground connection. 3. Gas: The equipment chamber needs to be filled with argon gas (purity of 99.99% or more). Self-provided argon gas cylinder (with Ø6mm double   ferrule joint) and pressure reducing valve 4. Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg 5. Ventilation device: need
Main features	1. Configure a single target gun, and a matching DC power supply for sputter   coating of conductive materials. 2. It can prepare a variety of films, and has a wide range of applications. 3. It is small in size and easy to operate.
Technical parameters	1. the power supply voltage: 220V 50Hz 2. rated power: 1200W (excluding vacuum pump) 3. Working vacuum degree: 10-4Pa 4. Working temperature: RT-500ºC, accuracy ± 1×(you can increase the temperature according to   actual needs) 5. the number of target guns: 1 6. target gun cooling method: water cooling 7. Target size: Ø2'', thickness 0.1-5mm   (different thickness depending on target material) 8. DC sputtering power: 500W (optional) 9. RF sputtering power: 300W / 500W (optional) 10. loading sample table: Ø140mm 11. the sample table speed: adjustable within   1rpm-20rpm 12. Protective gas: inert gases such as Ar and   N2 13. Intake gas path: mass flow meter controls 2   channels of intake air, flow rate is 200SCCM
Product specification	Main unit size: 500mm × 560mm × 660mm, the whole machine size: 1300mm × 660mm × 1200mm; weight: 160kg
Standard accessories	1	DC power control system	1
	2	Film thickness monitor system	1
	3	Molecular pump	1
	4	Chiller	1
	5	Cooling water pipe (Ø6mm)	4
Optional accessories	Various targets such as gold, indium, silver, and platinum