| Customization: | Available |
|---|---|
| Application: | School, Lab |
| Customized: | Customized |
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MPCVD single crystal diamond deposition equipment
MPCVD microwave plasma chemical vapor deposition (MPCVD) system is mainly used in single crystal diamond and poly crystal diamond film, diamond grown, diamond film chemical vapor deposition (CVD), material surface treatment and modification, low temperature oxide growth and other fields.
Application
Preparation of high-quality single crystal diamond;
Preparation of high-quality polycrystalline free-standing diamond films;
Preparation of high quality polycrystalline diamond films;
Preparation of various carbon nano films such as graphene, carbon nanotubes, fullerenes and diamond films.
Features
1) High production efficiency, large output, high quality, 7*7--81 diamonds, 8*8--65 diamonds, 9*9--51 diamonds, 10*10--42 diamonds, 12*12--26 diamonds, 15*15--17 diamonds
Different sizes, different number of diamonds.
2) The equipment has reached industrial production. The molybdenum stage is 90mm large, with fast growth speed, high yield rate and good stability.
3) The equipment is currently the first main equipment at home and abroad that can achieve industrialized production of single crystal diamond. The precision and quality of the processed components are extremely high.
4)The processing quality of our equipment is quite exquisite. Equipped with advanced production technology to ensure customers produce qualified product.
Technical specifications
| Vacuum | Vacuum measurement | Piezo resistive gauge 0.1-100kpa Capacitance gauge 0-1000Pa |
| Operating pressure range | 4-30Kpa | |
| Vacuum leakage rate | <1*10-9 Pa · m 3 / s | |
| Pressure control | Auto-Control | |
| Cavity material | Aluminum alloy excitation chamber, quartz vacuum chamber | |
| Observation window | Temperature measuring hole with diameter of 10mm and observation window of porous hole | |
| Cooling mode | Cooling mode | Water cooling+chamber air cooling |
| Sample table size | Molybdenum stage Φ 85mm, uniform area Φ 50mm | |
| Temperature measurement | Infrared thermometer, range 300-1400 ºC | |
| Cooling water flow | >50L/min | |
| Cooling water temperature | 20-22ºC | |
| Cooling water interface | 1-inch outer wire interface | |
| Operating system | Operating system | PLC control, 15 inch touch screen control |
| Process Menu | 10 process menus, 25 lines for each | |
| Microwave and power supply | Microwave frequency | 2.45±0.1GHz |
| Output power | 1.5-10Kw (equipped with 10kw domestic microwave power supply) | |
| Input power electricity | 380 Ac/50Hz, three-phase five wire (3 * 10+2 * 6 power line),>15Kw | |
| Microwave leakage rate | Microwave leakage rate 5cm away from the equipment ≤ 5Mw/cm2 | |
| Process gas | Flow-meter and interface | H2 (1000SCCM) CH4 (50SCCM) N2 (10SCCM) O2 (10SCCM) 1/4 "VCR female compressed air 8mm Pu tube quick plug |
| The flow-meter can change the type of gas used through software | ||
| Air supply pressure | 0.3-0.35MPa | |
| Compressed air pressure | 0.5-0.6MPa | |
| Vacuum pump | Rotary vane vacuum pump | Oil pump |
| Pumping speed | 4L/S | |
| Power supply | Ac 380V(±10%) | |
| Interface | Air extraction KF25, air exhaust KF25 | |
| Operating environment | Ambient temperature and humidity | The room temperature is lower than 26 ºC and the humidity is lower than 40% |
| Overall dimensions | Size | 1250(L)×800(W)×2100(H)mm |
| Equipment acceptance conditions: | 1. Equipment installation: After the equipment installation is completed, Party A and Party B shall conduct on-site commissioning, and Party B's technicians shall conduct equipment operation, safety and maintenance training for the person in charge of Party A. | |
| 2. System test: The system can be started and operated normally, and the detached fireball is stable without jumping. | ||
| 3. Microwave leakage: the microwave leakage is less than 5mW/cm2 (the output power of the microwave source is more than 80%, 10cm away from the equipment) | ||
Contact Information:
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