Hot Sale Synthetic Diamond Material Plasma CVD Diamond Making Machine CVD Machine, Mpcvd Diamond Deposition Equipment

• Application: School, Lab
• Customized: Customized
• Certification: CE, TUV
• Structure: Desktop
• Material: Steel
• Type: Mpcvd Furnace
• Model NO.: CY-MPCVD
• Transport Package: Ply Wooden Carton
• Trademark: CYKY
• Origin: Zhengzhou, China
• HS Code: 85143090
• Production Capacity: 20 Sets/Month

Product Description

MPCVD single crystal diamond deposition equipment

MPCVD microwave plasma chemical vapor deposition (MPCVD) system is mainly used in single crystal diamond and poly crystal diamond film, diamond grown, diamond film chemical vapor deposition (CVD), material surface treatment and modification, low temperature oxide growth and other fields.
 

Application

Preparation of high-quality single crystal diamond;

Preparation of high-quality polycrystalline free-standing diamond films;

Preparation of high quality polycrystalline diamond films;

Preparation of various carbon nano films such as graphene, carbon nanotubes, fullerenes and diamond films.

 

Features

1) High production efficiency, large output, high quality, 7*7--81 diamonds, 8*8--65 diamonds, 9*9--51 diamonds, 10*10--42 diamonds, 12*12--26 diamonds, 15*15--17 diamonds
Different sizes, different number of diamonds.
2) The equipment has reached industrial production. The molybdenum stage is 90mm large, with fast growth speed, high yield rate and good stability.
3) The equipment is currently the first main equipment at home and abroad that can achieve industrialized production of single crystal diamond. The precision and quality of the processed components are extremely high.
4)The processing quality of our equipment is quite exquisite. Equipped with advanced production technology to ensure customers produce qualified product.

Technical specifications

 

Vacuum	Vacuum measurement	Piezo resistive gauge 0.1-100kpa Capacitance gauge 0-1000Pa
	Operating pressure range	4-30Kpa
	Vacuum leakage rate	<1*10-9 Pa · m 3 / s
	Pressure control	Auto-Control
	Cavity material	Aluminum alloy excitation chamber, quartz vacuum chamber
	Observation window	Temperature measuring hole with diameter of 10mm and observation window of porous hole
Cooling mode	Cooling mode	Water cooling+chamber air cooling
	Sample table size	Molybdenum stage Φ 85mm, uniform area Φ 50mm
	Temperature measurement	Infrared thermometer, range 300-1400 ºC
	Cooling water flow	>50L/min
	Cooling water temperature	20-22ºC
	Cooling water interface	1-inch outer wire interface
Operating system	Operating system	PLC control, 15 inch touch screen control
	Process Menu	10 process menus, 25 lines for each
Microwave and power supply	Microwave frequency	2.45±0.1GHz
	Output power	1.5-10Kw (equipped with 10kw domestic microwave power supply)
	Input power electricity	380 Ac/50Hz, three-phase five wire (3 * 10+2 * 6 power line),>15Kw
	Microwave leakage rate	Microwave leakage rate 5cm away from the equipment ≤ 5Mw/cm2
Process gas	Flow-meter and interface	H2 (1000SCCM) CH4 (50SCCM) N2 (10SCCM) O2 (10SCCM) 1/4 "VCR female compressed air 8mm Pu tube quick plug
		The flow-meter can change the type of gas used through software
	Air supply pressure	0.3-0.35MPa
	Compressed air pressure	0.5-0.6MPa
Vacuum pump	Rotary vane vacuum pump	Oil pump
	Pumping speed	4L/S
	Power supply	Ac 380V(±10%)
	Interface	Air extraction KF25, air exhaust KF25
Operating environment	Ambient temperature and humidity	The room temperature is lower than 26 ºC and the humidity is lower than 40%
Overall dimensions	Size	1250(L)×800(W)×2100(H)mm
Equipment acceptance conditions:	1. Equipment installation: After the equipment installation is completed, Party A and Party B shall conduct on-site commissioning, and Party B's technicians shall conduct equipment operation, safety and maintenance training for the person in charge of Party A.
	2. System test: The system can be started and operated normally, and the detached fireball is stable without jumping.
	3. Microwave leakage: the microwave leakage is less than 5mW/cm2 (the output power of the microwave source is more than 80%, 10cm away from the equipment)

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