Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-Cy-600-2HD

Product Details
Customization: Available
Customized: Customized
Structure: Desktop
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  • Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-Cy-600-2HD
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Basic Info.

Model NO.
CY-600-2HD
Material
Steel
Certification
CE, TUV
Application
School, Lab
Type
Plasma
Transport Package
Ply Wooden Carton
Trademark
CYKY
Origin
Zhengzhou, China
HS Code
8486109000
Production Capacity
20 Sets/Month

Product Description

Input Power

1.220VAC 50/60Hz, single phase 
     2.2000W  (including pump)

Source Power

1.Two sputtering power sources are integrated into one control box

2. DC source: 500W for coating metallic materials

3.RF source: 600W with automatching for coating non-metallic materials ( Center)

4.Compact 300 RF source is available at extra cost

Magnetron Sputtering  Head

1.Two 2" Magnetron Sputtering  Heads with water cooling jackets are included   
     One is connected to RF power supply for no-conductive materials   
     Another is connected to DC sputtering power source for coating metallic materials

2.Target size requirement: 2" diameter

3.Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets

4.One stainless steel and one Al2O3 ceramic targets are included for demo testing

5.Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally  
     controlled recirculating water chiller is included for cooling both magnetron sputtering  
     heads

6.Customized coater: Two DC head without, RF sputtering,  RF head without  
     DC sputering,3 RF head are available upon request

Vacuum Chamber

1.Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel

2.Observation Window:  100 mm diameter

Sample Holder

1.Sample holder size: 140mm dia. for. 4" wafer max

2.Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating

3.The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C

Gas Flow Control

1.Flow rate:  200 ml/min max.

2.Flow rate is adjustable on the 6" touch screen control panel

Vacuum Pump Station

High speed turbo vacuum pump system is directly installed on the vacuum chamber 
      for max. vacuum level 

Heavy duty dual stage mechanical pump is connected to turbo pump for faster  
     pump speed

Mobile pump station is included and the compact sputtering coater can be put on 
     top of station

Max. vacuum level: 10^-6 torr with chamber baking     

Thickness Monitor

One Precision quartz thickness sensor is built into the chamber to monitor coating  
     thickness with accuracy 0.10 Å  

LED Display Unit outside chamber can:

Input material to be coated according to data base included

Display total thickness coated and coating speed

 5 pcs quartz sensors (consumable) are included 

Water cooling is required

Overall Dimensions

L6600mm× W660mm× H1200mm

Application Note

In order to remove oxygen from the chamber,  suggest you use 5% Hytrogen + 95 %  
     Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm

Please use > 5N purity Argon gas for plasma sputtering.  Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O

Net Weight

160 kg

Warranty

One years limited warranty with lifetime support


Laboratory DC/RF Dual-Head 2" Magnetron Plasma Sputtering Coater-Cy-600-2HD
 

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