Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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75379.11 USD
Terms of Payment
LC, T/T, D/P, Western Union
  • Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor
  • Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor
  • Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor
  • Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor
  • Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor
  • Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
  • Packaging & Shipping
  • Company Profile
  • FAQ
Overview

Basic Info.

Model NO.
CY-PECVD-500T-SS
Type
Coating Production Line
Coating
Vacuum Coating
Substrate
Steel
Certification
CE, RoHS
Condition
New
Product Name
Pecvd Reactor
Keywords
Pecvd
Smaple Size
200mm
Heating Temperature
Rt-2000c
RF Power
500W
Frequency
13.56MHz
Rotary
1-20rpm
Gas System
Mass Flow Meter
Spray Head
90mm
Transport Package
Wooden Box
Specification
1300*1000*1800mm
Trademark
CYKY
Origin
China
HS Code
8479899990
Production Capacity
20 Sets Per Month

Product Description

Lab plasma enhanced chemical vapor deposition system PECVD reactor
Product Description

Plasma-enhanced chemical vapor deposition (PECVD) is a type of chemical vapor deposition characterized by the use of plasma activation at low temperatures to enhance the chemical vapor deposition reaction. The advantages of this method are that the deposition temperature is low, the deposition rate is fast, and the film produced has excellent electrical properties, good substrate adhesion and excellent step coverage.
Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorPECVD vapor deposition application areas:

Plasma enhanced CVD systems can be used in: graphene preparation, sulfide preparation, nanomaterials preparation and other test sites. A variety of films such as    SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano -silicon, SiC, diamond-like, etc. can be deposited on the surface of flake or similar shape samples, and P -type and N-type doped films can be deposited. The deposited film has good uniformity, compactness, adhesion and insulation. Widely used in cutting tools, high-precision molds, hard coatings, high-end decoration and other fields, PECVD vapor deposition  has a wide range of applications in ultra -large scale integrated circuits, optoelectronic devices, MEMS and other fields.

Product Parameters

Technical data of PECVD reactor:

RF   power supply Signal   frequency 13.56MHz
Power   output range 0~500W
Maximum reflected power 100W
Reflected power <5W
Power stability ±0.1%
Working   Chamber Heating temperature RT-1000ºC
Temperature control accuracy ±1ºC
Sample holder Φ200mm
Rotating speed of sample holder 1-20rpm   adjustable
Spray head size Φ90mm
Distance The distance between the spray head and the sample is 40-100mm, adjustable
Working vacuum  0.133- 133Pa (can be adjusted according to the technical process)
Flange   The  top flange can be lifted by the motor, the substrate is easy to change, and   there is a visual window
Chamber Stainless steel material, Φ500mm * 500mm
Observation window Φ100mm, with baffle
Gas   supply
system
Channel numbers 6
Measuring unit Mass flow controller
Measuring   range A  channel: 0~200SCCM   for H2   Remarks:   If other ranges are required, please specify when ordering. According to the   customer's specific requirements, the flow meter of corresponding gas type   and range is optional.
B  channel: 0~200SCCM   for CH4
C  channel: 0~200SCCM   for C2H4
C  channel: 0~500SCCM   for N2
D  channel: 0~500SCCM   for NH3
E channel: 0~500SCCM   for Ar
Measurement accuracy ±1.5%F.S
Working pressure difference -0.15Mpa~0.15Mpa
Connecting pipe 304   stainless steel
Gas channel 304   stainless steel needle valve
Interface specification 1/4"   ferrule connector for gas inlet and outlet
Vacuum   system Backing pump 4.7L/s
Molecular pump 1200L/s
Vacuum measurement Compound  vacuum gauge, range 10-5Pa ~ 105Pa
Vacuum degree 5.0*10-3Pa
Water chiller Cooling water temperature <=37ºC
Water flow 10L/min
Power 0.1KW
Cooling   power 50W/ºC
Power supply AC220V   50Hz
Detailed Photos

Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor

Packaging & Shipping

We can ship the PECVD reactor by air by sea, also can arrange shipment according to your requirements.
Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor

Company Profile

Zhengzhou CY Scientific Instrument Co., Ltd. is a comprehensive company integrating design, research and development, production and sales.
Our main products are: spin coater, thermal evaporation coater, magnetron sputter coater, plasma sputter coater, E-beam evaporation coater, PLD pulse laser coating machine, plasma cleaner, CVD system, PECVD system, diamond wire cutting machine, melting furnace/stove, arc melting furnace, etc.
Our products are widely used in the field of materials science research. We have extensive cooperation with domestic universities, laboratories, and new material companies. It has been successfully exported to more than 20 countries and regions including the United States, the United Kingdom, Germany, Russia, Switzerland, Canada, Brazil, etc. and have established long-term cooperative relationships with local dealers.
If you are conducting materials research, please contact us and we will provide you with customized services to make your research experiments smoother!

Lab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd ReactorLab Plasma Enhanced Chemical Vapor Deposition System Pecvd Reactor

FAQ

Q. Are you manufacturer or trading company?
A. We are professional manufacturer of  laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service. 

Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.

Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.

Q. How to pay?
A. T T, L / C, D / P, etc.

Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.

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