• Laboratory 13.56MHz RF Generator Plasma Cleaner with 2L Capacity Cy-P2l-B
  • Laboratory 13.56MHz RF Generator Plasma Cleaner with 2L Capacity Cy-P2l-B

Laboratory 13.56MHz RF Generator Plasma Cleaner with 2L Capacity Cy-P2l-B

Application: Wafer
Cleaning Media: Dry Cleaning
Automation: Automatic
Cleaning Precision: Precision Industrial Cleaning
Control: PLC
Principle: Chemical Cleaning
Customization:

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Basic Info.

Model NO.
CY-P2L-B
Certification
CE, TUV
Condition
New
Customized
Customized
Feature
High Efficiency
Transport Package
Ply Wooden Carton
Trademark
CYKY
Origin
Zhengzhou, China
HS Code
8486204100
Production Capacity
20 Sets/Month

Product Description

Application
1.Car industry: ignition coil engine oil seal film
2.Defense industry: Aerospace electrical connectors,Kevlar deal
3.Electronics industry: hard plastic parts, earphone, Cell phone cover
4.Medical industry: intravenous infusion, catheter treatment
5.Textile fiber,rubber and plastic industry and etc

Featrues
1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features;
5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: all the parameters can be setted by the computer and data recording
7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed.

Technical Parameters
Power supply: AC220V
Working current: Total working current not higher than1.2A (Not include the vacuum pump)
RF Power: 200W
Radio frequency: 13.56MHZ(offset less than 0.2Hz)
Frequency offset Less than 0.2KHz
Characteristic impedance: 50 Ohm,Automatic matching
Vacuum degree: 30Pa-100Pa
Gas flow: 10-100ml/min(Adjustable)
Process Control: MCU Automatic and manual mode
Cleaning time: 1-6000 secds adjustable
Power supply: 10%-100% Adjustable
Inside chamber size 100mm×270mm
Outside dimension: 440*390*200mm
Weight: 35Kg
Vacuum chamber temperature Less than 65°C
Cooling type: Forced cooling

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