Customized: | Customized |
---|---|
Structure: | Desktop |
Material: | Steel |
Certification: | CE, TUV |
Application: | School, Lab |
Type: | Plasma |
Customization: |
---|
Suppliers with verified business licenses
Input Power | 1.Single phase 208 - 240 VAC, 50 / 60 Hz 2.< 1000 W (including vacuum pump) |
Vacuum Chamber | 1.Vacuum chamber: 100 mm ID x 130 mm H, made of fused glass 2.Sealing flange made of stainless 3.Needle valve on front panel for gas flow control |
Sample Stage | 1.Stage size: 40 mm Dia. 2.Sputtering distance range: 15 - 80 mm adjustable |
Control Panel | 1.Vacuum gauge and sputtering current meter for monitoring deposition 2.Needle valve on front panel for gas flow control 3.Sputtering timer: 0 - 110 s adjustable |
Vacuum Pump |
The followings are included: 1.156 L/m Double Stage Rotary Vane Vacuum Pump with vapor trap (Max vacuum 1.0E-2 Torr) 2.Stainless steel bellows with KF16 adapter and quick clamps 3.Two Stage ExhaustFilter on vacuum pump to eliminate oil vapor contamination |
Sputtering Targets | Target size requirements: 57 mm Dia. x 0.5 mm max 4N purity gold foil: 57 mm Dia. x 0.12 mm Optional Targets are available Au target (57 mm Dia. x 0.12 mm, 4N purity) Pt target (57 mm Dia. x 0.12 mm, 4N purity) Ag target (57 mm Dia. x 0.5 mm, 4N purity) |
Size | 480 mm L x 320 mm W x 280 mm |
Net Weight | 20 kg |
Compliance | CE approval |
Warranty | One year limited warranty with lifetime support |
Suppliers with verified business licenses