DC  Magnetron  Sputtering  Coater with Rotary  Stage and Water  Chiller

Product Details
Customization: Available
Type: Coating Spray Gun
Coating: Vacuum Coating
Manufacturer/Factory & Trading Company

360° Virtual Tour

Diamond Member Since 2016

Suppliers with verified business licenses

Audited Supplier

Audited by an independent third-party inspection agency

Registered Capital
75379.11 USD
Terms of Payment
LC, T/T, D/P, Western Union
  • DC  Magnetron  Sputtering  Coater with Rotary  Stage and Water  Chiller
  • DC  Magnetron  Sputtering  Coater with Rotary  Stage and Water  Chiller
Find Similar Products

Basic Info.

Model NO.
VTC-16-SM
Substrate
Copper
Certification
CE, TUV
Condition
New
Specimen Chamber
Quartz Glass Tube
Distance
Adjustable
Control Panel
Touch Screen
Gas
Needle Valve
Name
DC Magnetron Sputtering Coater
Transport Package
Wooden Box
Specification
dia. 50mm
Trademark
CY
Origin
Zhengzhou, China
HS Code
8543709990
Production Capacity
210 Sets Per Month

Product Description

DC Magnetron Sputtering Coater machine w Rotary Stage & Water Chiller - VTC-16-SM
Introduction
VTC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater with a water cold  2"  target head , water chiller and rotatable sample holder, which is designed for coating all metallic films, including Zn, Al, Ti light metallic film  at affordable cost. One Aluminium  target  is included 
for immediate use.  

Technical parameters

 
Input Voltage 110/220VAC switchable
Output Power 1600VDC  250W   150mA max.
Built-in over current (>150mA) protection
Specimen chamber Quartz glass tube, 167mm OD. x 152mm ID x 260mm Height
Sputtering Head 
&
Specimen stage
2" magnetron sputtering head with water cooling jacket  is included
One 50 mm Dia  stainless steel .sample stage is built in, which is 
rotatable from 0 - 5 RPM 
One manually operated shutter is build in to achieve better coating
Built in a fixture to place sputtering head when open chamber
Distance between sputtering head and sample stage is adjustable 
from 60 - 100 mm.

One Air Cold Recirculating Water Chiller  10L / min Flow is included for 
cooling sputtering head.
Control Panel 6" color  touch-screen control panel for easy operation
One panel controls all parameters, including vacuum, current, target 
position and substrate heating temperature
Ultimate Vacuum 
Pressure
Built in KF25 vacuum port
The system requires a Ar gas tank with pressure regulator, which is
 not included

<10E-2 mbar by vane vacuum pump (not included)
7.5E-5 mbar by Turbo molecular pump (not included)
Gas Atmosphere One needle valve installed to allow Ar gas inlet to achieve better
 plasma coating
Target Target size: 50 mm dia. x (0.1 - 3) mm,thickness

DC&#160; Magnetron&#160; Sputtering&#160; Coater with Rotary&#160; Stage and Water&#160; Chiller
DC&#160; Magnetron&#160; Sputtering&#160; Coater with Rotary&#160; Stage and Water&#160; Chiller
DC&#160; Magnetron&#160; Sputtering&#160; Coater with Rotary&#160; Stage and Water&#160; Chiller
DC&#160; Magnetron&#160; Sputtering&#160; Coater with Rotary&#160; Stage and Water&#160; Chiller

 

Send your message to this supplier

*From:
*To:
*Message:

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now
Contact Supplier