13.56MHz RF Generator Plasma Cleaner with 10L Capacity for Wafer Cleaning&Etching Cy-P10L-B

• Customization: Available
• Type: Generator
• Feature: Plasma
• Model NO.: CY-P10L-B
• Certification: CE, TUV
• Condition: New
• Customized: Customized
• Transport Package: Ply Wooden Carton
• Trademark: CYKY
• Origin: Zhengzhou, China
• HS Code: 8486204100
• Production Capacity: 20 Sets/Month

Product Description

Application
1.Car industry: ignition coil engine oil seal film
2.Defense industry: Aerospace electrical connectors,Kevlar deal
3.Electronics industry: hard plastic parts, earphone, Cell phone cover
4.Medical industry: intravenous infusion, catheter treatment
5.Textile fiber,rubber and plastic industry and etc

Featrues
1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features;
5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: all the parameters can be setted by the computer and data recording
7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed.

Technical Parameters

Power supply:	AC220V
Working current:	Total working current not higher than1.2A (Not include the vacuum pump)
RF Power:	200W
Radio frequency:	13.56MHZ(offset less than 0.2Hz)
Frequency Range	0~500w,adjustable
Characteristic impedance:	50 Ohm,Automatic matching
Vacuum degree:	30Pa-100Pa
Gas flow:	10-100ml/min(Adjustable)
Process Control:	MCU Automatic and manual mode
Cleaning time:	1-6000 secds adjustable
Power supply:	10%-100% Adjustable
Inside chamber size	200mm×350mm
Outside dimension:	780*650*650mm
Weight:	85Kg
Vacuum chamber temperature	Less than 65°C
Cooling type:	Forced cooling