Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials

Product Details
Customization: Available
After-sales Service: on-Line Service
Warranty: One Year
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  • Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
  • Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
  • Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
  • Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
  • Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
  • Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
  • Packaging & Shipping
  • Company Profile
  • FAQ
Overview

Basic Info.

Model NO.
CY-PECVD50-1200-Q
Coating
Vacuum Coating
Substrate
Steel
Certification
CE, RoHS
Condition
New
Product Name
Pecvd Tube Furnacepecvd System
Keywords
Pecvd
Tube Size
50mm
Tube Length
1200mm
RF Power
300W
Frequency
13.56MHz
Heating Zone
200mm*2
Gas System
Mass Flow Meter
Tube Material
Quartz
Working Temperature
<1100c
Transport Package
Wooden Box
Specification
1300*900*1200mm
Trademark
CYKY
Origin
China
HS Code
8479899990
Production Capacity
20 Sets Per Month

Product Description


1Plasma-enhanced chemical vapor deposition PECVD system for thin films depositing of carbon-based materials
 
Product Description

Plasma-enhanced chemical vapor deposition (PECVD) is a type of chemical vapor deposition characterized by the use of plasma activation at low temperatures to enhance the chemical vapor deposition reaction. The advantages of this method are that the deposition temperature is low, the deposition rate is fast, and the film produced has excellent electrical properties, good substrate adhesion and excellent step coverage.

PECVD vapor deposition application areas:

Plasma enhanced CVD systems can be used in: graphene preparation, sulfide preparation, nanomaterials preparation and other test sites. A variety of films such as    SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano -silicon, SiC, diamond-like, etc. can be deposited on the surface of flake or similar shape samples, and P -type and N-type doped films can be deposited. The deposited film has good uniformity, compactness, adhesion and insulation. Widely used in cutting tools, high-precision molds, hard coatings, high-end decoration and other fields, PECVD vapor deposition  has a wide range of applications in ultra -large scale integrated circuits, optoelectronic devices, MEMS and other fields.

Product Parameters

Technical data of PECVD:

Vacuum Tube Furnace Model CY-PECVD50-1200-Q
Total Power 3kw
Tube material High purity quartz
Tube diameter 50mm
Tube length 1200mm
Furnace chamber length 440mm
Heating zone length 200mm+200mm
Operating temperature 0~1150ºC
Thermocouple K type
Temperature control accuracy ±1ºC
Temperature control mode 30 segment program temperature control
Display mode LED (highlight digital tube display)
Sealing method 304 stainless steel vacuum flange
Flange interface 1/4" cutting sleeve joint (Ø8 pagoda joint)
Rotary Speed 0-13rpm
Vacuum 4.4×10E-3Pa
Power supply AC:220V 50/60Hz
Gas  System Model TN-3F
Gas channel 3-channel
Measuring unit Mass flow meter
Measuring range A channel: 0~200sccm  H2 gas
B channel: 0~200sccm  N2 gas
C channel: 0~500sccm  Ar gas
measurement accuracy ±1.5%
Pipe pressure resistance 3MPa
Working pressure difference 0.1-0.5Mpa
Connecting pipe 304 stainless steel
Gas channel 304 stainless steel needle valve
Interface specification 1/4" cutting sleeve joint for gas inlet and outlet
Vacuum System Mechanical pump Rotary vane vacuum pump
Pumping rate 1.1L/S    
Exhaust interface KF16
Vacuum measurement Pirani gauge
Ultimate vacuum 1×10E-1Pa
Power supply AC:220V 50/60Hz
Pumping interface KF40
RF Power Supply Frequency 13.56Mhz
Output 0-500W
Max. reflected power 100W
Connection 50Ω,N-Type,female
Detailed Photos

1. WE have CVD/PECVD machine with gas supply system+vacuum system+tube furnace + plasma generator.

2. Tube furnace (temperature) :1200C, 1400C, 1600C, customized temperature is available.

3. Tube furnace (heating zone) :single zone, dual zone, triple zone, customized No. of heating zone is available.

4. Tube Material: quartz, corundum, alloy, and other material of tube is customization.

5. Tube with different diameter and length is customization.

6. Plasma generator:  150W, 300W, 500W, 1000W, and other power of plasma generator is customization.

7. Flow meter: 1~3 or multi channel flow meter is optional based on your process.

8. Customized CVD/PECVD system according to your reswarch process is available.

Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials
Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials

Packaging & Shipping

We can ship the PECVD reactor by air by sea, also can arrange shipment according to your requirements.
Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials

Company Profile

Zhengzhou CY Scientific Instrument Co., Ltd. is a comprehensive company integrating design, research and development, production and sales.
Our main products are: spin coater, thermal evaporation coater, magnetron sputter coater, plasma sputter coater, E-beam evaporation coater, PLD pulse laser coating machine, plasma cleaner, CVD system, PECVD system, diamond wire cutting machine, melting furnace/stove, arc melting furnace, etc.
Our products are widely used in the field of materials science research. We have extensive cooperation with domestic universities, laboratories, and new material companies. It has been successfully exported to more than 20 countries and regions including the United States, the United Kingdom, Germany, Russia, Switzerland, Canada, Brazil, etc. and have established long-term cooperative relationships with local dealers.
If you are conducting materials research, please contact us and we will provide you with customized services to make your research experiments smoother!

Plasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based MaterialsPlasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based MaterialsPlasma-Enhanced Chemical Vapor Deposition Pecvd System for Thin Films Depositing of Carbon-Based Materials

FAQ

Q. Are you manufacturer or trading company?
A. We are professional manufacturer of  laboratory instruments, We have professional R&D team and workshop, which can promise the qulaity and after-sale service. 

Q. How's your warranty?
A. Our warranty is 12 months, and provide lifetime maintenance. We provide 24 hours on-line service.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A. 5-10 days----in store. Customzied products---It usually takes 30-60 days depending on your requirements.

Q. Power supply and plug?
A. We can provide products accroding to your local voltage and plug standard.

Q. How to pay?
A. T T, L / C, D / P, etc.

Q. How is the package of goods? Delivery methods?
A. Standard export fumigation sign wooden box packaging or as your requirements.

 

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