10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System

Product Details
Customization: Available
Cleaning Process: Vapor Cleaning
Style: Mobile Style
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  • 10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System
  • 10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System
  • 10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System
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Basic Info.

Model NO.
CY-P10L-B
Usage
Auto Industry
Principle
Chemical Cleaning
Fuel
Electric
Certification
CE, TUV
Control
PLC
Automation
Automatic
Condition
New
Remote Control
Without Remote Control
Customized
Customized
RF Power
200-400W
RF Frequency
13.56MHz
Chamber
High Purity Quartz Tube
Impedance Matching
Automatic
Display
LCD
Warranty
One Year
Transport Package
Wooden Box
Specification
10L
Trademark
CY
Origin
Zhengzhou, China
HS Code
85141090
Production Capacity
210 Sets/Month

Product Description

CY  10L plasma cleaning system
Feature

1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features;
5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: all the parameters can be set by the computer and data recording
7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed.
 
Technical parameters
 
Model CY-P10L-B
Working current: Total working current not higher than 2A (Not include the vacuum pump)
Chamber High purity quartz tube
RF frequency 13.56MHz
RF power 200-400W
Frequency offset <0.4KHz
Vacuum degree 60Pa-100Pa
Cleaning time 1-6000s adjustable
Gas flow >10-100ml
Process Control manually/automatic
Power 10-100%adjustable
Cleaning capacity 10L
Exhaust pipe KF vacuum flange+vacuum aluminum pipe
Vacuum Pump Bipolar direct rotary vane pump
Impedance matching automatic
Display LCD
Power supply AC 220V 60Hz
 
Application

1.Car industry: ignition coil engine oil seal film

2.Defense industry: Aerospace electrical connectors,Kevlar deal

3.Electronics industry: hard plastic parts, earphone, Cell phone cover

4.Medical industry: intravenous infusion, catheter treatment

5.Textile fiber,rubber and plastic industry and etc
10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System
10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System
Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.Our main products include: tube furnace, muffle furnace, plasma cleaner, vacuum furnace, atmosphere furnace,CVD system and customized
lab equipment
.Welcome you come to visit us. 


10L 13.56MHz Laboratory Silicon Wafer Plasma Cleaning System

 

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