• Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
  • Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
  • Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
  • Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
  • Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
  • Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film

Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film

After-sales Service: 1 Year
Warranty: 1 Year
Application: Industry, School, Lab
Customized: Customized
Certification: CE
Structure: Desktop
Customization:
Diamond Member Since 2016

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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
Overview

Basic Info.

Model NO.
CY-PECVD-200SST
Material
Stainless Steel
Type
Tubular Furnace
RF Power Supply Cooling Method
Air-Cooling
Heating Zone
Single Heating Zone 200mm
Temperature Accuracy
+-1c
Furnace Tube Material
High Purity Quartz
Furnace Tube Size
Dia. 50*1200mm
Adjustable Speed
0-20rpm
Transport Package
Standard Export Wooden Packaging
Trademark
CYKY
Origin
Zhengzhou Henan China
HS Code
8401200000
Production Capacity
50sets Per Month

Product Description

plasma enhanced chemical vapor deposition pecvd for Continuous Graphene or Two Dimensional Film Growthe
Product Description

Plasma -enhanced chemical vapor deposition (PECVD) is a type of chemical vapor deposition characterized by the use of plasma activation at low temperatures to enhance the chemical vapor deposition reaction. The advantages of this method are that the deposition temperature is low, the deposition rate is fast, and the film produced has excellent electrical properties, good substrate adhesion and excellent step coverage.

PECVD vapor deposition application areas:
Plasma enhanced CVD systems can be used in: graphene preparation, sulfide preparation, nanomaterials preparation and other test sites. A variety of films such as    SiOx, SiNx, amorphous silicon, microcrystalline silicon, nano -silicon, SiC, diamond-like, etc. can be deposited on the surface of flake or similar shape samples, and P -type and N-type doped films can be deposited. The deposited film has good uniformity, compactness, adhesion and insulation. Widely used in cutting tools, high-precision molds, hard coatings, high-end decoration and other fields, PECVD vapor deposition  has a wide range of applications in ultra -large scale integrated circuits, optoelectronic devices, MEMS and other fields.
 

Product Parameters

 

  Model number CY-PECVD-200SST
  Cavity size Phi 500 -
  Warm zone length 200
  Rf power supply 500W-
  Temperature 1000  ºC
  Pump for forestage Molecular pump set
  Display type T
  Warm zone I-
  Water cooler CW5200
  Cavity material SS
  Sample       heating
Heating temperature
Above   RT-1000ºC,   temperature   control   accuracy:   ±1.C,   using temperature control meter for temperature control;
Adjustable speed: 1-20rpm adjustable
  Spray head size Φ90mm, the electrode  spacing  between the spray head and the sample 40-100mm  online continuous adjustable (can  be adjusted according to the process), and with a ruler index display
  Sample Table 200mm diameter
  Working vacuum for deposition 0.133-133Pa (can be adjusted according to process)
  Top flange It can be lifted by motor, the substrate is easy to change, and there is a visual port
Substrate Table Linear and azimuth motion of the substrate table, substrate heating and temperature control, mounting table and touch screen control, substrate linear motion is manually controlled, and substrate rotation is controlled by DC motors  
Vacuum chamber Front door opening type,  φ500mm X 500mm stainless steel  
Observation window φ100mm with baffle  
Mass flowmeter Six way mass flow meter  
Number paths of gas Six paths  
Pressure range 0.15 Mpa to 0.15 Mpa  
Range 0 to 100 SCCM (oxygen)
0 to 100 SCCM (CF4)
0 to 200 SCCM (SF6)
0 to 200 SCCM (argon)
0 to 500 SCCM (other gases air)
0-500 SCCM (other gases nitrogen)
 
Flow control range Plus or minus 1.5%  
Gas path material 304 stainless steel  
Pipe joint 6.35mm bushing joint  
Vacuum system Front pump: oil-free vacuum pump 4.7L/S
Molecular pump: 1200L/S
 
Measuring range 1 x 10-5 to 1 x 105Pa  
Measurement accuracy 1 x 10-5 ~ 1 x 10-4Pa±40% reading
1 x 10-4 ~ 1 x 105Pa for a reading of ±20%
 
Detailed Photos

Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene FilmPlasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene FilmPlasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film



Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.

Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film
Plasma Enhanced Chemical Vapor Deposition Pecvd for Continuous Graphene Film

Q. Are you a manufacturer or a trading company?
A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?
A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?
A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?
A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?
A.T / T, L / C, D / P, etc., it is recommended to use Alibaba Trade Guarantee.

Q. How is the package of goods? Delivery methods?
A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service


 

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