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Zhengzhou CY Scientific Instrument Co., Ltd.

Mini Magnetron Sputtering System, Desktop Magnetron Sputtering Machine, Magnetron Sputtering Source manufacturer / supplier in China, offering Mini Compact Desktop Magnetron Plasma Sputtering Coater, High Temperature High Purity 99.97% Alumina Ceramic Tube, Ce Certified Graphene Growth CVD Furnace Machine and so on.

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Supplier Homepage Product Film Coating Mini Compact Desktop Magnetron Plasma Sputtering Coater

Mini Compact Desktop Magnetron Plasma Sputtering Coater

FOB Price: US $5,100 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $5,100/ Piece
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Port: Zhengzhou, China
Production Capacity: 210 Sets Per Month
Payment Terms: L/C, T/T, Western Union

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Basic Info
  • Model NO.: CY-1100X-SPC-12
  • Coating: Vacuum Coating
  • Certification: CE, TUV
  • Vacuum Chamber: High Purity Fused Glass
  • Control Panel: Touch Screen Panel
  • Trademark: CY
  • Specification: dia. 40mm
  • HS Code: 8543709990
  • Type: Coating Spray Gun
  • Substrate: Ceramic
  • Condition: New
  • Sample Stage: Dia.40mm
  • Warranty: One Year
  • Transport Package: Wooden Box
  • Origin: Zhengzhou
Product Description
Mini Plasma Sputtering Coater with Vacuum Pump & Gold Target, 1.5" Max Sample - CY-1100X-SPC12-LD
CY-1100X-SPC12-LD is a compact plasma sputtering coater designed for making metallic coatings, such as gold, platinum, Indium and silver etc. Especially for coating conductive gold film for SEM sample. The plasma sputtering coater is shipped with all necessary accessories for immediate use, including one sputtering head with gold sputtering target (gold cathode), vacuum pump, stainless steel bellows and quick clamps.
Input Power
Single phase 208 - 240 VAC, 50 / 60 Hz
< 1000 W (including vacuum pump)
Vacuum Chamber

Vacuum chamber: 100 mm ID x 130 mm H, made of fused glass
Sealing flange made of stainless
Needle valve on front panel for gas flow control
Sample Stage
Stage size: 40 mm Dia.
Sputtering distance range: 15 - 80 mm adjustable
Control PanelVacuum gauge and sputtering current meter for monitoring deposition
Needle valve on front panel for gas flow control
Sputtering timer: 0 - 110 s adjustable
Vacuum Pump

The followings are included: 
156 L/m Double Stage Rotary Vane Vacuum Pump with vapor trap (Max vacuum 10^-2 Torr)
Stainless steel bellows with KF16 adapter and quick clamps
Two Stage Exhaust Filter on vacuum pump to eliminate oil vapor contamination
One High purity Au target (57 mm Dia. x 0.12 mm, 4N purity)
Optional: you may use a turbo pump to achieve 10^-4 Torr vacuum by a turbo pump
Sputtering TargetsTarget size requirements: 57 mm Dia. x 0.5 mm max
4N purity gold foil: 57 mm Dia. x 0.12 mm (Included and pre-installed on coater) 
Optional Targets are available 
Au target (57 mm Dia. x 0.12 mm, 4N purity) 
Pt target (57 mm Dia. x 0.12 mm, 4N purity)  
Ag target (57 mm Dia. x 0.5 mm, 4N purity)  
Size480 mm L x 320 mm W x 280 mm H       
Net Weight20 kg
Shipping Weight55 kg (120 lbs) with 1020 mm x 790 mm x 560 mm (40" x 31" x 22")
ComplianceCE approval
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