Lab Dual-Head High Vacuum 2" Magnetron Sputtering Coater Deposition Metal Film, Alloy Nano Film

• Type: Coating Production Line
• Coating: Plasma Sputtering Coater
• Substrate: Ceramic and Metal
• Certification: CE
• Condition: New
• Product Name: DC/RF Dual-Head Magnetron Plasma Sp
• Model NO.: CY-MSP-300-DCRF
• DC Source: 500W
• RF Source: 300W
• Transport Package: Wooden Case
• Specification: plasma sputtering system
• Trademark: CYKY
• Origin: China
• Production Capacity: 500 Sets Per Month

Product Description

DC/RF Dual-Head High Vacuum 2" Magnetron Plasma Sputtering Coater
 
CY-VTC-600-2HD is a compact magnetron sputtering system with dual 2"  target sources, e.g., one DC source for coating metallic film, and another RF source for coating non-metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of  materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE  etc.  at low cost.
 
Specification of the dual head magnetron plasma sputtering coater
 

Input Power	220VAC 50/60Hz, single phase 2000W (including pump)
Source Power	Two sputtering power sources are integrated into one control box  DC source: 500W for coating metallic materials  RF source: 300W for coating non-metallic materials
Magnetron Sputtering Head	Two 2" Magnetron Sputtering Heads with water cooling jackets are included One is connected to RF source for non-conductive materials The other one is connected to DC source for coating metallic materials Target size requirement: 2" diameter Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate) One Cu and one fused SiO2 targets are included for demo testing Recommend Coating Method Customized coater: Two DC heads without RF sputtering; two RF heads without DC sputering; 3 RF head are available upon request Optional: 148 cm RF cable is replaceale with extra cost
Vacuum Chamber	Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel Observation Window: 100 mm diameter Hinged type lid on top with pneumatic power pole makes target exchange easily
Sample Holder	Sample holder size: 140mm dia. for. 4" wafer max Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow Control	Two precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in Flow rate: 200 ml/min max. (0-200 SCCM) Flow rate is adjustable on the 6" touch screen control panel
Vacuum Pump Station	High speed turbo vacuum pump (made in Germany) is directly installed on the vacuum chamber for max. vacuum level  Heavy duty dual stage mechanical pump, 220 liters/minute (7.8CFM) is connected to turbo pump for faster pumping speed Mobile pump station is included and the compact sputtering coater can be placed on top of station Standard Vacuum Level: < 4x10^-5 Torr . Max. vacuum level: 10^-6 torr with chamber baking
Water Chiller	One Digital Temperature Controlled Recirculating Water Chiller is included for cooling both magnetron sputtering heads. Refrigeration range : 5~35°C Floowing Rate: 16L/minute
Optionals	Precise quartz Film Thickness Monitor is available upon reuqest to built into the chamber to monitor coating thickness with accuracy 0.10 Å. Pricesion Thin Film & Coating Analysis Systems with Measurement Capability is available for measure film thickness after coating.
Overall Dimensions	Lid closed: 48" × 28" × 32" Lid open: 48" × 28" × 37"
Net Weight	200 kg
Warranty	One years limited warranty with lifetime support

 

Detailed Photos

reference picture of the dual head magnetron plasma sputtering coater


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our company information:
Zhengzhou CY Scientific Instrument Co., Ltd.-founded in  2013 is a high and new technology enterprise registered in Zhengzhou,Henan province. We mainly supply the lab instruments for material research in labs like the cutting machine, milling machine, polishing machine, sintering furnace, mixing machine, glove box, film coating machine, etc.


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