Gold Member Since 2016
Audited Supplier
Zhengzhou CY Scientific Instrument Co., Ltd.

Tabletop Plasma Cleaner, Compact Plasma Cleaner, Wafer Plasma Cleaner manufacturer / supplier in China, offering Tabletop Plasma Cleaner with Adjustable Power Range, High Temperature High Purity 99.97% Alumina Ceramic Tube, Ce Certified Graphene Growth CVD Furnace Machine and so on.

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Supplier Homepage Product Plasma Cleaning System Tabletop Plasma Cleaner with Adjustable Power Range

Tabletop Plasma Cleaner with Adjustable Power Range

Purchase Qty.:
1 2+
FOB Unit Price: US $4,500 US $4,400
Purchase Qty. (Pieces) FOB Unit Price
1 US $4,500
2+ US $4,400
Get Latest Price
Port: Zhengzhou, China
Production Capacity: 210 Sets Per Month
Payment Terms: L/C, T/T, Western Union

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Basic Info
  • Model NO.: CY-P10L-B
  • Cleaning Media: Dry Cleaning
  • Cleaning Precision: Precision Industrial Cleaning
  • Principle: Physical Cleaning
  • Condition: New
  • Feature: High Efficiency
  • Vacuum Degree: 60PA-100PA
  • Gas Flow: >10-100ml
  • Transport Package: Wooden Box
  • Origin: Zhengzhou, China
  • Application: Textile Industry
  • Automation: Automatic
  • Control: PLC
  • Certification: CE, TUV
  • Customized: Customized
  • RF Power: 200-400W
  • Cleaning Time: 1-6000s Adjustable
  • Trademark: CY
  • Specification: 2L
  • HS Code: 851410900
Product Description
CY  Conductor chip plasma cleaner/Wafer plasma cleaner with LCD touch screen
1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features;
5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: all the parameters can be setted by the computer and data recording
7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed.
Technical parameters
Working current:Total working current not higher than 2A (Not include the vacuum pump)
RF frequency13.56MHz
RF power200-400W
Frequency offset<0.4KHz
Vacuum degree60Pa-100Pa
Cleaning time1-6000s adjustable
Gas flow>10-100ml
Process Controlmanually/automatic
Cleaning capacity10L
Exhaust pipeKF vacuum flange+vacuum aluminum pipe
Vacuum PumpBipolar direct rotary vane pump
Impedance matchingautomatic
Power supplyAC 220V 60Hz
Application of  Wafer plasma cleaner

1.Car industry: ignition coil engine oil seal film

2.Defense industry: Aerospace electrical connectors,Kevlar deal

3.Electronics industry: hard plastic parts, earphone, Cell phone cover

4.Medical industry: intravenous infusion, catheter treatment

5.Textile fiber,rubber and plastic industry and etc
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