• Tabletop Plasma Cleaner with Adjustable Power Range
  • Tabletop Plasma Cleaner with Adjustable Power Range
  • Tabletop Plasma Cleaner with Adjustable Power Range

Tabletop Plasma Cleaner with Adjustable Power Range

Application: Textile Industry
Cleaning Media: Dry Cleaning
Automation: Automatic
Cleaning Precision: Precision Industrial Cleaning
Control: PLC
Principle: Physical Cleaning
Customization:
Diamond Member Since 2016

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Basic Info.

Model NO.
CY-P10L-B
Certification
CE, TUV
Condition
New
Customized
Customized
Feature
High Efficiency
RF Power
200-400W
Vacuum Degree
60PA-100PA
Cleaning Time
1-6000s Adjustable
Gas Flow
>10-100ml
Transport Package
Wooden Box
Specification
2L
Trademark
CY
Origin
Zhengzhou, China
HS Code
851410900
Production Capacity
210 Sets Per Month

Product Description

CY  Conductor chip plasma cleaner/Wafer plasma cleaner with LCD touch screen
 
Feature
1. Environmental technologies: plasma process is the role of gas - solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most of the polymer material can be a good deal;
3. Low temperature: close to room temperature, particularly suitable polymer materials, have a longer retention time and a higher surface tension than the corona and flame method.
4. Multifunctions: it involves only a shallow surface of polymer materials (10 -1000A), while preserving the characteristics of the material itself can give it one or more  new features;
5. Low cost: the device is simple, easy operation and maintenance, continuous operation,a few bottles of gas can replace thousands of kilograms cleaning fluid
6. The whole process technology can be controlled: all the parameters can be setted by the computer and data recording
7. Treated geometry Unlimited: Big or small, simple or complex, parts or textiles can be processed.
 
Technical parameters
 
Model CY-P10L-B
Working current: Total working current not higher than 2A (Not include the vacuum pump)
RF frequency 13.56MHz
RF power 200-400W
Frequency offset <0.4KHz
Vacuum degree 60Pa-100Pa
Cleaning time 1-6000s adjustable
Gas flow >10-100ml
Process Control manually/automatic
Power 10-100%adjustable
Cleaning capacity 10L
Exhaust pipe KF vacuum flange+vacuum aluminum pipe
Vacuum Pump Bipolar direct rotary vane pump
Impedance matching automatic
Display LCD
Power supply AC 220V 60Hz
 
Application of  Wafer plasma cleaner

1.Car industry: ignition coil engine oil seal film

2.Defense industry: Aerospace electrical connectors,Kevlar deal

3.Electronics industry: hard plastic parts, earphone, Cell phone cover

4.Medical industry: intravenous infusion, catheter treatment

5.Textile fiber,rubber and plastic industry and etc
 

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