• Two Zones Css Furnace for Rapid Thermal Processing Upto 5" Dia Wafer at Max. 800c
  • Two Zones Css Furnace for Rapid Thermal Processing Upto 5" Dia Wafer at Max. 800c
  • Two Zones Css Furnace for Rapid Thermal Processing Upto 5" Dia Wafer at Max. 800c
  • Two Zones Css Furnace for Rapid Thermal Processing Upto 5" Dia Wafer at Max. 800c

Two Zones Css Furnace for Rapid Thermal Processing Upto 5" Dia Wafer at Max. 800c

Customized: Customized
Structure: Desktop
Material: Alloy
Certification: CE, TUV
Application: School
Type: Heating Type
Customization:
Diamond Member Since 2016

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Basic Info.

Model NO.
CY-OTF-1200X-RTP-II-5
Vacuum Flange
Stainless Steel
Temperature Controller
Digital
Working Temperature
800c
Thermocouple
K Type
Warranty
One Year
Transport Package
Wooden Box
Specification
OD. 200mm
Trademark
CY
Origin
Zhengzhou, China
HS Code
85141090
Production Capacity
130 Sets/Month

Product Description

Two Zones CSS Furnace for Rapid Thermal Processing upto 5" Dia Wafer at Max.800°C - OTF-1200X-RTP-II-5
 Introduction
OTF-1200X-RTP-II is a two heating zone rapid thermal processing  furnace with 11" I.D.quartz tube. 
It is designed for PVD or CSS (
Close Spaced Sublimation) film coating up to 3" diameter or 2"x2" square. The furnace is heated by two group of halogen heaters (Top and Bottom) separately with max. 20ºC/s heating rate. Two 30 segment precision temperature controllers are built in with +/-1ºC accuracy. RS485 port and control software are included to allow for the operation of furnace and temperature profile logging via PC.  It is excellent tool to research new generation thin film for solar cell, such as CdTe, Sufide and Perovskite solar cell 
 
Specification:
Furnace structure
 Vacuum Chamber
 
 
Furnace, two temperature controllers, two channel gas flow meters are integrated into a mobile aluminum alloy frame
The chamber is made of high purity fused quartz tube
Quartz tube size: 11" OD/10.8" ID x 9" H
The vacuum flanges are made of Stainless Steel 316
Vacuum Flanges Top Flange with one KFD-25 vacuum port and one gas outlet (1/4" pipe required) can slide up or down manually to load and unload substrate and evaporated material easily
Bottom flange has one KFD-25 vacuum port with one gas inlet (1/4" pipe required) with needle valves
Flange is sealed by double silicone o-rings and can achieve max. vacuum pressure of 10E-2 Torr by a quality mechanical pump and 10E-5 Torr by molecular pump
One digital vacuum gauge is installed on the top flange.  
Precision annti-corrosion digital vacuum gauge is optional at extra cost ( Pic. 2)
Gas Flow Meters
 
 
Gas mixer integrated with two float-meters with adjustable measurement ranges of:
16 -160 mL/m
500 - 5000 mL/m (for purging purpose)
Heater and
Sample Holder

 
 
Two independently controlled heaters with manually adjustable gap from 2 - 30 mm
20 pcs Halogen lamps are used as heating element for rapid thermal processing.
Heaters are is made of stainless steel with water cold jacket to reduce heat radiation and allow for fast cooling.
5" dia. circular wafer holder is built into top heater for holding substrate.
One set of high thermal-conductive AlN plates (5" Dia. x 0.5mm Thick) are included (place on the back of substrate to make it heat uniformly).
A 16L/min recirculating water chiller is included for saving water source
Temperature Controller Two precision digital temperature controllers with 30 segments programmable offer independent controlling of top and bottom heaters
Each controller has PID auto tune function to protect heaters from overshooting and alarm function to avoid overheating and thermal couple broken
PC communication interface & software is installed for (click picture below for details) recording temperature profile shown as below
Working Temperature Max. temperature for each heaters: <= 800ºC
Max. temperature difference between two heaters: <= 300ºC depends on spacing between two heaters:
Spacing 30mm       
Max. temp difference:  315ºC @ heating bottom only
Heating &Cooling Rate Heating: > 8ºC/s ( heating single heater only )
Cooling: > 10ºC/s (600 - 100ºC) Max.
Thermal Couple Two K-type thermal couples are installed on top and bottom heaters separately
Working Voltage 208 - 240VAC, single phase, 20A air breaker
Power Requirement 2200W total ( 1100W for each heater )
Warranty One year limited with life time support
Dimensions 1085mm L x 680mm W x 1710mm H
Two Zones Css Furnace for Rapid Thermal Processing Upto 5&quot; Dia Wafer at Max. 800cTwo Zones Css Furnace for Rapid Thermal Processing Upto 5&quot; Dia Wafer at Max. 800cTwo Zones Css Furnace for Rapid Thermal Processing Upto 5&quot; Dia Wafer at Max. 800cTwo Zones Css Furnace for Rapid Thermal Processing Upto 5&quot; Dia Wafer at Max. 800c
Factory

Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.Our main products include: tube furnace, muffle furnace, plasma cleaner, vacuum furnace, atmosphere furnace,CVD system and customized lab equipment.Welcome you come to visit us. 


Two Zones Css Furnace for Rapid Thermal Processing Upto 5&quot; Dia Wafer at Max. 800c
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Two Zones Css Furnace for Rapid Thermal Processing Upto 5&quot; Dia Wafer at Max. 800c

 

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