• Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace
  • Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace
  • Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace

Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace

Application: Industry, School, Lab
Customized: Customized
Certification: CE, TUV
Structure: Desktop
Material: Aluminum
Type: Tubular Furnace
Customization:

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Basic Info.

Model NO.
CY-PECVD- E
Output Power
5-300W
Reflection Power
Max. 200W
Noise
<50 dB
Matching
Automatic
Tube Size
Customized
Transport Package
Wooden Box
Specification
OD. 60mm
Trademark
CYKY
Origin
Zhengzhou, China
HS Code
85141090
Production Capacity
2100 Sets Per Month

Product Description

Plasma Enhanced Chemical Vapor Deposition  PECVD furnace used for CVD graphene growth    

Introduction

 CY-PECVD- E is an affordable and compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace
system with auto slidable mechanism. It consists of a 300W RF plasma generator, a 2"O.D split tube furnace and the 
integrated slidable rail which allows you preheat and slide the furnace to the sample zone in order to get your sample
an instant exposure under high temperature. This system can be updated to advanced model with optionals.  It is ideal tool
for  the researcher to make innovation under limited budget.

It can be used to do   a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H)
deposition.

  Specification
Auto slidable Split Tube furnace Input power: 208 - 240V AC, 1.2kW
1200°C Max. working temperature for < 60 minutes
1100°C Max for continuous heating
High purity quartz tube 2"OD x 1.7"ID x  39.4" Length 
30 segments programmable precision digital temperature controller
8" (200mm), single zone. 2.3" (60mm)  (+/-1°C) @ 1000°C 
The tube furnace part is a auto sliding RTP tube furnace, and equipped with touch screen controller for easy operation.
The sliding speed can be controlled with the auto sliding control.
Plasma RF Generator Output Power:          5 -300W adjustable with ± 1% stability
RF frequency:          13.56 MHz ±0.005% stability
Reflection Power:      200W max.
Matching:                 Automatic
RF Output Port:        50 Ω, N-type, female
Noise:                      <50 dB. 
Cooling:                    Air cooling. (water cooling is available upon request, and a water chiller can be ordered separately)
Power :                     208-240VAC, 50/60Hz
Vacuum Flange and Fittings Vacuum flange set is made of stainless steel 304. 
Left flange assembly includes a KF-25 vacuum port,  two KF-25 quick clamp,a KF-25 right angle valve, a KF-25 vacuum bellows, a flange support 1/4 O.D hose fitting, and a needle valve.
Right flange assembly includes a digital pirani gauge, 1/4 O.D tube fitting, 1/4" feedthrough and a needle valve.
Vacuum Pump  AC 220V 50 Hz  1/2HP  375W
2 Liter /S  or 120 liter/m 
Oil trap (inlet) and exhaust filter (outlet) are installed.
Max. vacuum:  10-6 torr with turbo pump
For the vacuum degree less than 0.1 pa please choose the vane rotary vacuum pump 760 torr.
Product Dimensions Net weight: 350 lbs
Shipping weight: 480 lbs
Optional Please choose below gas delivery systems based on your budget 
Low cost Compact Anti-Corrosion Three Channel Gas Mixer
Compact Liquid Vaporization Systems
Three Channels MFC Gas Control System 
Constant temperature control module
Warranty  One year limited warranty with lift time support (Consumable parts such as processing tubes, o-rings and heating elements are not covered by the warranty, please order the replacement at related products below.)
Compliance CE Certified Temperature controller is MET and CE Certified
Warning The tube furnaces with quartz tube are designed for using under vacuum and low pressure < 0.12 MPa (absolute pressure) rizing the furance chamber and ensure a safe operation. 

Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace
Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.Our main products include: tube furnace, muffle furnace, plasma cleaner, vacuum furnace, atmosphere furnace,CVD system and customized
lab equipment
.Welcome you come to visit us. 


Low Temperature Pecvd Plasma Enhanced Chemical Vapor Deposition Graphene Furnace





 

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