Cleaning Process: | Plasma Cleaning |
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Style: | Wafers |
Clean Type: | Plasma Cleaning |
Usage: | Auto Industry, Metallurgical Industry, Pharmaceutical,Food Industry |
Principle: | Chemical Cleaning |
Fuel: | Electric |
Customization: |
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Model | CY-P2L |
Working Voltage | AC 220V 50Hz |
Power | 550W |
Chamber Dimension | 100mm*270mm |
RF Frequency | 13.56MHz (±1%) |
Working vacuum | 20~40Pa |
Gas channel | 2 channel float flowmeter |
Operation interface | Touch screen liquid crystal display |
Output power | 0-150W continuously adjustable |
Cleaning chamber material | high purity quartz, clean, anticorrosion |
Vacuum pump | 4L/S double-stage rotary vane vacuum pump with anti-return oil device |
Vacuum pump interface | KF16 |
Vacuum gauge | Built-in high precision digital vacuum gauge |
Timing function | Preset cleaning time |
Working mode | Can be automatically and manually freely selected |
Cleaning power | 0~150W can be adjusted freely |
Cleaning gas | Argon, nitrogen, oxygen, clean air |
Coupling method | Non-contact inductive coupling, can effectively prevent the sample from contaminating of electrode. |
Operating temperature | 0-40 ° C (power supply / display) |
Temperature range | 5%-85RH, no condensation |
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