• Four-Target Magnetron Sputtering Coating Machine for Semiconductor
  • Four-Target Magnetron Sputtering Coating Machine for Semiconductor
  • Four-Target Magnetron Sputtering Coating Machine for Semiconductor
  • Four-Target Magnetron Sputtering Coating Machine for Semiconductor
  • Four-Target Magnetron Sputtering Coating Machine for Semiconductor
  • Four-Target Magnetron Sputtering Coating Machine for Semiconductor

Four-Target Magnetron Sputtering Coating Machine for Semiconductor

After-sales Service: 1 Year
Warranty: 1 Year
Type: Coating Production Line
Coating: Vacuum Coating
Substrate: Steel
Certification: CE
Customization:
Diamond Member Since 2016

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  • Overview
  • Product Description
Overview

Basic Info.

Model NO.
CY-MSH500X-III-DCDCRF-SS
Condition
New
Cooling Mode
Water Cooling
Water Chiller
Circulating Water Chiller with Flow Rate of 10L/Mi
Chamber Size
Dia.300mm*300mm
Chamber Material
Stainless Steel
Opening Mode
Top Cover Open
Backing Pump
Rotary Vane Pump
Ultimate Vacuum
1.0e-5PA
Transport Package
Wooden Case
Specification
Customized
Trademark
CYKY
Origin
Zhengzhou, China
HS Code
8416100000
Production Capacity
100pieces/Month

Product Description

Four-target magnetron sputtering coating machine for semiconductor 
Product Description

Four-target   magnetron   sputtering   coater    is   a   cost-effective    magnetron sputtering   coater independently  developed  by  our  company,  which  has  the characteristics  of  standardization, modularization and customization. The magnetron target has a choice of 1 "2", customers can choose according to the size of the plated substrate; The power supply is 500W DC power supply and 500W RF power supply, DC power supply can be used for the preparation of metal film, RF power supply can be used for the preparation of non-metal film, three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, you can customize other RF power supply and pulse power supply, each type of power supply has a variety of specifications from 300W to 1000W.
The coating instrument is equipped with two high-precision mass flowmeters. If customers have other needs, they can customize the gas path of up to four mass flowmeters to meet the needs of complex gas environment construction; The instrument is equipped with advanced turbomolecular pump group, the limit vacuum can reach  1.0E-5Pa, and other types of molecular pumps are available for purchase. The gas route of the molecular pump is controlled by multiple solenoid valves, which can realize that the chamber can be opened and the sample can be taken out without the pump, which greatly improves your work efficiency. This product can be selected as an industrial computer to control the system, in the computer program can achieve the control of the vacuum pump group, sputtering power supply control and other most functions, can further improve your experimental efficiency.
The four target magnetron sputtering coating instrument can be used to prepare single or multi- layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, oxide film, hard film, polytetrafluoroethylene film and so on. Compared with similar equipment, the three-target magnetron sputtering coateris not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material films in the laboratory

Dual-target DC magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Dual-target DC magnetron sputtering coater technical parameters:
 

Coating    vacuum
system

Vacuum
assembly
60m3/h  mechanical  pump  and  KYKY1600L  molecular
pump to form the pumping system and equipped with high- precision   composite   vacuum   gauge   to   measure   and monitor the vacuum degree in realtime;

Pumping time
After the system is exposed to the atmosphere for a short time and filled with dry nitrogen, then pumping begins. The  vacuum   degree  is  less  than   5×10-4Pa  within   30 minutes, and the vacuum degree is less than 5Pa after the system stops pumping and shuts down for 12 hours;
Ultimate
vacuum
≤6×10-5Pa
Valve
assembly
Pre-extraction valve DN40, electric main valve CF200, DN16  vent  valve,   DN40  solenoid  valve   and  various vacuum  lines,  etc.  (the  above  valves  are  pneumatic  or electric)
Vacuum
automatic
constant
pressure
The equipment can quickly reach the high vacuum, and can be automatically adjusted in real time when the required vacuum degree is reached after the process air intake, so as to maintain a stable vacuum degree, reduce the process to a high degree, and ensure the repeatability of the prepared sample.
Magnetron
sputtering
generation       and control     reaction system
Coating
chamber limit vacuum
≤6×10-5Pa; System vacuum leak detection rate: ≤8.0×10-7 Pa.l/S
Vacuum
chamber size
500 x 500 x 420mm,
Gas type Argon, nitrogen, hydrogen, oxygen
Substrate size as    well    as functional
components
Substrate sizes of Φ4 inches (compatible with small sizes) can  be  placed;   Substrate  rotation  range   5~60  RPM adjustable;   Substrate   heating   temperature   600±1ºC, controlled by thermocouple closed-loop feedback (i.e. PID temperature control)
Cooling
method
Water cooling
Sputter deposition and control system Control
system
PLC+ PC software coating machine control system
Constant pressure  working  intake of air
Use a thin film vacuum gauge for measurement
Measuring
range
3 Pa 0.013 Pa
Target   number size, 4 2-inch sputter targets
Target
Spacing
The four targets are sputtered vertically upward, and the distance between the target and the sample is adjustable

Power Supply
2 sets of 500W RF sputtering power supply (automatic matching), 2 sets of 500W DC sputtering power supply, 1 set of 500W bias power supply (improve the density and uniformity of the film layer, and have sputtering cleaning function)
Process      air
Intake assembly
2  way  MFC  mass  flow  meter  controls  gas  flow   (0- 100SCCM, 0-200 SCCM), accurate to 0.1 sccm adjustable

Evenness
The uniformity of the inner membrane thickness of the 4- inch diameter wafer sample is less than 3%, and the error between the center point and the edge thickness is less than 3%
Other Supply
voltage
AC220V,50Hz
Overall
dimensions
600mm X 650mm X 1280mm
Machine
weight
350kg
Machine
power
4KW
Dual targets magnetron sputtering coater product pictures:
Four-Target Magnetron Sputtering Coating Machine for SemiconductorFour-Target Magnetron Sputtering Coating Machine for SemiconductorFour-Target Magnetron Sputtering Coating Machine for SemiconductorFour-Target Magnetron Sputtering Coating Machine for SemiconductorFour-Target Magnetron Sputtering Coating Machine for SemiconductorFour-Target Magnetron Sputtering Coating Machine for SemiconductorFour-Target Magnetron Sputtering Coating Machine for SemiconductorFour-Target Magnetron Sputtering Coating Machine for Semiconductor

Four-Target Magnetron Sputtering Coating Machine for Semiconductor

Founded in 2005, Zhengzhou CY Scientific Instrument Co., Ltd. is a company specializing in the development and production of laboratory technology research equipment. The products are mixed, pressed, burned, cut, ground, polished, coated, analytical equipment and related consumables. Products include laboratory sintering equipment, coating equipment and so on. At present, it has been exported to 25 countries and regions such as the United States, Europe, and Southeast Asia, and has been well received by various scientific research units.

We have a mature technology research and development team, the number of technicians is 33, the company has 150 people, more than 500 square meters of office space, the factory covers an area of about 1,500 square meters located in Zhengzhou High-tech Zone Electronic Industrial Park. The products are mainly located in the research market, serving scientific research in the labs of universities and colleges, and can also customize products according to your needs.
Four-Target Magnetron Sputtering Coating Machine for Semiconductor
Four-Target Magnetron Sputtering Coating Machine for Semiconductor
Four-Target Magnetron Sputtering Coating Machine for Semiconductor

Q. Are you a manufacturer or a trading company?

A. We are professional laboratory instrument manufacturers, have their own design team and factory, have mature technical experience, and can guarantee the quality of products and the optimal price.

Q. How is your company's product after-sales service system?

A. The product warranty period is 12 months, we can provide lifetime maintenance. We have professional pre-sales and after-sales departments that can respond to you within 24 hours to resolve any technical issues.

Q. How long is your delivery time? If I want to customize the instrument, how long does it take?

A.1. If the goods are in stock, it is 5-10 days. 2. We can provide customized services for our customers. It usually takes 30-60 days depending on the specifications of the custom instrument.

Q. Our country's power supply and plug are different. How do you solve it?

A. We can supply a transformer and plug according to your local requirements according to the power plug of different countries.

Q. How to pay?

A.T / T, L / C, D / P, etc., it is recommended to use Alibaba Trade Guarantee.

Q. How is the package of goods? Delivery methods?

A.1. Standard export fumigation sign wooden box packaging 2. Express, air, sea shipping according to customer requirements, find the most suitable way.

More questions, please contact customer service

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