New Designed RF and DC Power Supply Magnetron Sputtering System with Two Targets

• Application: Industry, School, Lab
• Customized: Customized
• Certification: CE
• Structure: Vertical
• Material: Stainless Steel
• Type: Coating
• Model NO.: CY-VTC-600-2HD
• Transport Package: Plastic Paper Inside,Polyfoam Filled,Wooden Box Ou
• Specification: customized
• Trademark: CYKY
• Origin: China
• HS Code: 8486202200
• Production Capacity: 199/Month

Product Description

New designed RF and DC power supply magnetron sputtering system with two targets

CY-VTC-600-2HD is a magnetron sputtering system featuring dual target sources: 1) DC source for coating metallic
material on one head and 2) RF source for coating non-metallic material on the other head. It is equipped with a film thickness tracker to enable the user to easily monitor the coating progress and also recordthe data. 
   
This model is sophsticatedly designed for coating single or multiple film layers of a wide range of substrate materials (ferroelectric, condutive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE and etc). Its
compactness and ease of operation make it an ideal coating system for use in R&D labs. 
Technical Parameters:
 

Input Power	220VAC 50/60Hz, single phase 2000W  (including pump)
Source Power	Two sputtering power sources are integrated into one control box DC source: 500W for coating metallic materials RF source: 600W with automatching for coating non-metallic materials Compact 100 RF source is available at extra cost
Magnetron Sputtering  Head	1.Two 2" Magnetron Sputtering  Heads with water cooling jackets are included One is connected to RF power supply for no-conductive materials Another is connected to DC sputtering power source for coating metallic materials 2.Target size requirement: 2" diameter 1/16" max. thickness for metallic targets 1/4" max. thickness for no-conductive targets One stainless steel and one Al2O3 ceramic targets are included for demo testing 3.Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally controlled recirculating water chiller is included for cooling both magnetron sputtering heads 4.Customized coater: Two DC head without, RF sputtering,  RF head without DC sputering, 3 RF head are available upon request
Vacuum Chamber	Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel Observation Window:  100 mm diameter Hinged type cover on top with air spring sport makes target exchange easy
Sample Holder	Sample holder size: 140mm dia. for. 4" wafer max The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C
Gas Flow Control	One precision digital MFC (mass flow controller) are installed to allow two types of gases to be filled in Flow rate:  200 ml/min max. Flow rate is adjustable on the 6" touch screen control panel
Vacuum Pump Station	1.High speed turbo vacuum pump system is directly installed on the vacuum chamber for max. vacuum level  2.Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed 3.Mobile pump station is included and the compact sputtering coater can be put on top of station 4.Max. vacuum level: 10^-6 torr with chamber baking
Overall Dimensions	L1300mm× W660mm× H1200mm
Net Weight	160 kg
Warranty	One years limited warranty with lifetime support