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Zhengzhou CY Scientific Instrument Co., Ltd.

Rotary Sputtering Coater, Plasma Magnetron Sputtering Machine, Thermal Evaporator Price manufacturer / supplier in China, offering Ce Certified Compact Rotary Plasma Magnetron Sputtering Coater, High Temperature High Purity 99.97% Alumina Ceramic Tube, Ce Certified Graphene Growth CVD Furnace Machine and so on.

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Supplier Homepage Product Film Coating Ce Certified Compact Rotary Plasma Magnetron Sputtering Coater

Ce Certified Compact Rotary Plasma Magnetron Sputtering Coater

FOB Price: US $8,200 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $8,200/ Piece
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Port: Zhengzhou, China
Production Capacity: 210 Sets Per Month
Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram

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Basic Info
  • Model NO.: CY-VTC-16-3HD-LD
  • Coating: Vacuum Coating
  • Certification: CE, TUV
  • Vacuum Chamber: High Purity Quartz
  • Control Panel: Touch Screen
  • Trademark: CY
  • Specification: ID. 150mm
  • HS Code: 8543709990
  • Type: Powder Coating Booth
  • Substrate: Aluminum
  • Condition: New
  • Sample Stage: Dia.50mm
  • Shield: Stainless Steel
  • Transport Package: Wooden Box
  • Origin: Zhengzhou, China
Product Description
3 Rotary Target Plasma Sputtering Coater w. Substrate Heater (500°C) Including 3 Targets - VTC-16-3HD-LD
VTC-16-3HD-LD is a CE certified compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1- 3 types of metallic materials to sample with diameter up to 50 mm. Three sputtering targets: gold, silver, copper are included for immediate use.
Input PowerSingle phase 220 VAC, 50 / 60Hz
700 W (including vacuum pump)
For using 110V AC, we will include a transformer for you. Please select the voltage in the Product Options
Output Power1600 VDC
40 mA max
Vacuum ChamberVacuum chamber: 150 mm ID x 150 mm H, made of high purity quartz
Sealing flange made of stainless steel with flat O-ring
Sample Stage with HeaterStage size: 50 mm Dia.
Sputtering distance range: 25 - 40 mm adjustable
Rotatable stage with three sputtering positions (controlled by the touch screen)
Substrate heater is built-in with a maximum heating temperature of 500 °C
PID temperature controller with +/- 1 °C accuracy is integrated to the touch screen
Control Panel
6" color touch screen with PLC integration for easy operation
Vacuum gauge, sputtering current meter, and substrate temperature control are integrated to the touch screen panel
Adjustment knobs on the front panel for gas intake and sputtering current control
Sputtering position, sputtering timer, and process logging are accessible from the touch screen
ShieldStainless steel shield cage is included for extra protection
Sputtering Targets
Target size requirements: 47 mm Dia. x 2.5 mm max
Three targets are included in standard package for immediate use:
Au target, 47 mm Dia. x 0.12 mm
Ag target, 47 mm Dia. x 0.5 mm
Cu target, 47 mm Dia. x 2.5 mm
Vacuum Pump

Built-in KF25 vacuum port for connecting to a vacuum pump
Vacuum pump with KF25 connector is required, but not included. User may choose
A double stage mechanical vacuum pump for vacuum up to 10^-2 Torr
Or a turbo pump for vacuum up to 10^-4 Torr
Vacuum pump can be plugged in the power outlet on the left of coater for automatic control
Dimensions440 mm L × 330 mm W × 455 mm H
Net Weight50 kg
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