Gold Member Since 2016
Audited Supplier
Zhengzhou CY Scientific Instrument Co., Ltd.

DC Magnetron Sputtering Coater, DC Plasma Sputtering Coater, Plasma Sputtering &Evaporation Coater manufacturer / supplier in China, offering High Power DC Magnetron Sputtering Coater W Rotary Stage & Water Chiller - Vtc-16-Sm, High Temperature High Purity 99.97% Alumina Ceramic Tube, Ce Certified Graphene Growth CVD Furnace Machine and so on.

(/ )

Supplier Homepage Product Film Coating High Power DC Magnetron Sputtering Coater W Rotary Stage & Water Chiller - Vtc-16-Sm

High Power DC Magnetron Sputtering Coater W Rotary Stage & Water Chiller - Vtc-16-Sm

FOB Price: Get Latest Price
Min. Order: 1 Piece
Port: Zhengzhou, China
Production Capacity: 20 Sets/Month
Payment Terms: T/T, Western Union

Request a custom order and have something just for you!

Send Customized Request
Product Catalog
Film Coating
50 Products
Product Image
Product Name
FOB Price
Product Package
Product Attribute
Product Table
Basic Info
  • Model NO.: VTC-16-SM
  • Structure: Desktop
  • Certification: CE, TUV
  • Type: Plasma
  • Transport Package: Ply Wooden Carton
  • HS Code: 8486109000
  • Customized: Customized
  • Material: Steel
  • Application: School, Lab
  • Trademark: CYKY
  • Origin: Zhengzhou, China
Product Description
    VTC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater with a water cooling2"target head, water chiller and rotatable sample holder. The coating unit is designed for coating all metallic films up to 4" diameter wafer including Zn, Al, Ti and carbon light film at an affordable cost. One Al target is included for immediate use.
Input Voltage220 VAC 50/60Hz 
Output Powera.1600 VDC
b.250 W
c.150 mA max.
d.Built-in over current protection (>150 mA)
Specimen ChamberQuartz glass tube, 167 mm OD. X 152 mm ID x 260 mm Height

Sputtering Head  &
Specimen Stage
a.2" flexible magnetron sputtering head with water cooling jacket is included
b.One 50 mm Dia stainless steel sample stage is rotatable from 0 - 5 RPM
c.One manually operated shutter for target protection.
d.Sputtering head holder is available for holding sputtering head while non-operation.
c.The distance between the sputtering head and sample stage is adjustable from 60 - 100 mm.
d.Max Coating area: 4" diameter max. 
e.One Air Cold Recirculating Water Chiller 10 L/min Flow is included for cooling sputtering head.
Control Panel1.6" color  touch-screen control panel with PLC integration for easy operation
2.One panel for all parameters monitor and control: vacuum, current.
Ultimate Vacuum Pressure1.Built-in KF25 vacuum port
2.The system requires an Ar gas tank with pressure regulator. (not included)
3.< 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, Mo targets (not sensitive to air)
4.< 1.0E-5 Torr by Turbomolecular pump(not included) for Al, Mg, Li, Lr, Ti, Zn targets (sensitive to air)
5.The lowest vacuum may reach < 4.0E-6 Torr by pumping overnight and baking    
Gas AtmosphereOne needle valve installed to allow Ar gas inlet to achieve better plasma coating
The system requires an Ar gas tank with pressure regulator (not included)

One 2"  Copper target  is included for testing, Target size: 2" Dia.x 2.5mm.

It also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, Mg, etc. almost every kind of metallic material.   
    Warning : Aluminum ,Chromium or Nickel Target   can be coating by this machine, but please view the Recommend Coating Method before using.Please using RF Plasma Magnetron Sputtering for coating Alumina                  
Optional Film Thickness Monitor1.Film thickness monitor is optional at extra cost
2.Heatable sample stage up to 500°C is available upon request at extra cost
3.Flowmeter for accurate control gas inlet  is available upon request at extra cost.
Overall DimensionL440mm×W330 mm×H290mm
Net Weight20 kg
Shipping Weight & Dimension160 lbs
45" x 45" x 40"
ComplianceCE approval          
WarrantyOne year limited with lifetime support
Application NotesWarning: Sputtering head connects to HIGH voltage. The operator must wear gloves during operation
Make sure the target, sputtering head, substrate, and heating stage are clean before coating, need to use the sandpaper and alcohol to clean and fresh the Al or Nickel target each time using.

High Power DC Magnetron Sputtering Coater W Rotary Stage & Water Chiller - Vtc-16-Sm
High Power DC Magnetron Sputtering Coater W Rotary Stage & Water Chiller - Vtc-16-Sm

You Might Also Like
Send your message to this supplier
Mr. Aron
To: Mr. Aron

Enter between 20 to 4,000 characters.

This is not what you are looking for? Post a Sourcing Request Now