High Power DC Magnetron Sputtering Coater W Rotary Stage & Water Chiller - Vtc-16-Sm

• Customized: Customized
• Structure: Desktop
• Material: Steel
• Certification: CE, TUV
• Application: School, Lab
• Type: Plasma
• Model NO.: VTC-16-SM
• Transport Package: Ply Wooden Carton
• Trademark: CYKY
• Origin: Zhengzhou, China
• HS Code: 8486109000
• Production Capacity: 20 Sets/Month

Product Description

    VTC-16-SM is a High Power Desktop Magnetron Plasma Sputtering Coater with a water cooling2"target head, water chiller and rotatable sample holder. The coating unit is designed for coating all metallic films up to 4" diameter wafer including Zn, Al, Ti and carbon light film at an affordable cost. One Al target is included for immediate use.
SPECIFICATIONS

Input Voltage	220 VAC 50/60Hz
Output Power	a.1600 VDC b.250 W c.150 mA max. d.Built-in over current protection (>150 mA)
Specimen Chamber	Quartz glass tube, 167 mm OD. X 152 mm ID x 260 mm Height
Sputtering Head  & Specimen Stage	a.2" flexible magnetron sputtering head with water cooling jacket is included b.One 50 mm Dia stainless steel sample stage is rotatable from 0 - 5 RPM c.One manually operated shutter for target protection. d.Sputtering head holder is available for holding sputtering head while non-operation. c.The distance between the sputtering head and sample stage is adjustable from 60 - 100 mm. d.Max Coating area: 4" diameter max.  e.One Air Cold Recirculating Water Chiller 10 L/min Flow is included for cooling sputtering head.
Control Panel	1.6" color  touch-screen control panel with PLC integration for easy operation 2.One panel for all parameters monitor and control: vacuum, current.
Ultimate Vacuum Pressure	1.Built-in KF25 vacuum port 2.The system requires an Ar gas tank with pressure regulator. (not included) 3.< 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, Mo targets (not sensitive to air) 4.< 1.0E-5 Torr by Turbomolecular pump(not included) for Al, Mg, Li, Lr, Ti, Zn targets (sensitive to air) 5.The lowest vacuum may reach < 4.0E-6 Torr by pumping overnight and baking
Gas Atmosphere	One needle valve installed to allow Ar gas inlet to achieve better plasma coating The system requires an Ar gas tank with pressure regulator (not included)
Target	One 2"  Copper target  is included for testing, Target size: 2" Dia.x 2.5mm. It also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, Mg, etc. almost every kind of metallic material.        Warning : Aluminum ,Chromium or Nickel Target   can be coating by this machine, but please view the Recommend Coating Method before using.Please using RF Plasma Magnetron Sputtering for coating Alumina
Optional Film Thickness Monitor	1.Film thickness monitor is optional at extra cost 2.Heatable sample stage up to 500°C is available upon request at extra cost 3.Flowmeter for accurate control gas inlet  is available upon request at extra cost.
Overall Dimension	L440mm×W330 mm×H290mm
Net Weight	20 kg
Shipping Weight & Dimension	160 lbs 45" x 45" x 40"
Compliance	CE approval
Warranty	One year limited with lifetime support
Application Notes	Warning: Sputtering head connects to HIGH voltage. The operator must wear gloves during operation Make sure the target, sputtering head, substrate, and heating stage are clean before coating, need to use the sandpaper and alcohol to clean and fresh the Al or Nickel target each time using.